镁与锂共掺杂氧化锌纳米薄膜的结构与特性研究  

Study on property and structure of Li and Mg co-doped ZnO nano-film

作　　者：季德春[1] 谢骏[1] 胡辉[1] 

机构地区：[1]中国海洋大学化学化工学院,山东青岛266100

出　　处：《无机盐工业》2017年第7期30-34,共5页Inorganic Chemicals Industry

摘　　要：以溶胶凝胶法成长了锂与镁共掺杂氧化锌纳米薄膜,并且探讨了锂掺杂与镁掺杂对薄膜结构、光学特性及电性质的影响。结果发现,锂掺杂量增加时XRD的2θ值向低角度偏移,VO缺陷随锂掺杂量增加而变大,进而使薄膜内含氧量降低且呈富锌(Zn-rich)态。在富锌状态下Lii缺陷增加,进而使得电子浓度增大。镁掺杂能降低,VO缺陷形成,使薄膜内含氧量提高而转向富氧(O-rich)态,在偏富氧态下Lii缺陷形成几率降低,LiZn缺陷形成几率增大。锂掺杂氧化锌薄膜的导电型态为n型,再掺杂镁时则能提升含氧量而抑制施体型缺陷的形成,得到Li_(0.008)Zn_(0.933)Mg_(0.059)O薄膜呈p型导电型态。Li and Mg co-doped ZnO nano-film was prepared by sol-gel method and the influences of Li and Mg co-doping on structure,optical property,and electrical property ofthese films were discussed. Results showed that the 2θ of XRD gradually movedtolowanglewithLidopingcontentincreasing.TheVO defectbecamemorewithLidopingcontent increasingandthen the oxygen content in films decreased,and it led to the f i lm be Zn-rich.The Lii defect became more and then the electron concentration also increased in the state of Zn-rich.Mg doping could inhibit the growth of V o defect and might increase the oxygen content,and it led to the f i lm be O-rich.The formation of Lii defects decreased and the formation of Li^ defects in-creased in the state of O-rich.The conductive type of Li doped ZnO f i lm was n type,and then Mg doping in ZnO f i lm could in- creasetheoxygencontentandinhibit thegrowthofdonordefects.Theconduct ivetypeofLi0 .008 Zn0.933 Mg0.059 O film w a s p typeobtained in the experiment.

关 键 词：氧化锌 纳米薄膜 共掺杂 缺陷 溶胶-凝胶 

分 类 号：TQ132.41[化学工程—无机化工]