磁控溅射硅氮类保护膜摩擦性能的分析与表征  

Analysis and characterization of tribological property of protective silicon nitride film deposited by magnetron sputtering

作　　者：石志锋[1,2] 宁成云[2] 王迎军[2] 

机构地区：[1]华南理工大学分析测试中心,广东广州510640 [2]华南理工大学国家人体组织功能重建工程技术研究中心,广东广州510640

出　　处：《电镀与涂饰》2017年第13期679-683,共5页Electroplating & Finishing

基　　金：国家重大基础研究项目973计划(2012CB619100);广东省科技厅省部产学研结合项目(2008A090400014)

摘　　要：采用四靶直流非平衡磁控溅射技术在Co–28Cr–6Mo合金表面沉积了硅氮(SiN)薄膜。借助接触角仪、纳米压痕仪以及摩擦磨损试验机考察了基体偏压对硅氮薄膜表面自由能的影响,并评价了它们的机械性能和摩擦学行为。硅氮薄膜是一类具有两性分子特性的功能材料,表现出良好的湿环境摩擦学性能,是极具潜力的水介质润滑生物机械薄膜。随着基体负偏压增加,薄膜在胎牛血清稀释液中的摩擦因数急剧下降。Silicon nitride （SIN） films were deposited on the surface of Co-28Cr-6Mo alloy by four-target direct current unbalanced magnetron sputtering technique. The effect of the substrate bias voltage on SiN film＇s surface free energy was studied by contact angle meter, nanoindenter and friction and wear tester, and their mechanical properties and tribological behavior were evaluated. The as-deposited SiN film is a functional material of amphipathic nature, and shows good tribological properties in wet environment. Therefore it is a kind of potential biomechanical membrane under water lubrication. The friction coefficient of the film in a diluted fetal bovine serum is decreased greatly with the increasing of substrate bias voltage.

关 键 词：钴铬钼合金 硅氮薄膜 磁控溅射 表面自由能 摩擦学行为 

分 类 号：TB43[一般工业技术]