注入器Ⅱ离子源控制系统设计  

Design of Control System of Ion Source for Injector Ⅱ

作　　者：郭玉辉[1] 詹帅[1,2] 王永鹏[1,2] 刘海涛[1] 武启[1] GUO Yu-hui ZHAN Shuai WANG Yong-peng LIU Hai-tao WU Qi(Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China University of Chinese Academy of Sciences, Beijing 100049, China)

机构地区：[1]中国科学院近代物理研究所,甘肃兰州730000 [2]中国科学院大学,北京100049

出　　处：《原子能科学技术》2017年第8期1527-1531,共5页Atomic Energy Science and Technology

基　　金：中国科学院战略性先导科技专项资助项目(XDA03021503)

摘　　要：为实现离子源设备的远程监控、束流强度可调和当设备发生异常时的快速切束控制,采用PLC、串口服务器和自制FPGA控制板卡设计了基于EPICS架构的离子源控制系统。同时,改进了原有PLC和电机系统的EPICS IOC程序。整套系统工作可靠、稳定,完全满足注入器Ⅱ系统的调试运行需求。快速切束时间小于10μs,完全切束动作在60s内完成。In order to remotely monitor the instrument,adjust the beam intensity and cut off the beam quickly in exceptional cases,the ion source control system which is based on the EPICS architecture was designed by using PLC,serial device server and FPGA control board.At the same time,the EPICS IOC programs for the motor and PLC system were improved.The whole system is reliable,stable and can meet the commissioning requirement of injectorⅡ.The beam fast cut-off time is less than 10 μs and the entire process time of cut-off beam to be completed is within 60 s.

关 键 词：EPICS 离子源 PLC 运动控制 

分 类 号：TL503.6[核科学技术—核技术及应用]