基于塔尔博特自成像光刻机的照明系统设计与分析  

Design and Analysis of Illumination System of Talbot Self-Imaging Lithographic Equipment

作　　者：佟军民[1,2] 刘俊伯[2] 胡松[2] 

机构地区：[1]许昌职业技术学院,河南许昌461000 [2]中国科学院光电技术研究所,四川成都610209

出　　处：《激光与光电子学进展》2017年第8期260-268,共9页Laser & Optoelectronics Progress

基　　金：国家自然科学基金(61376110)

摘　　要：针对塔尔博特自成像光刻机对照明系统的特定需求,基于成像照明光学设计理论,引入非成像光学理论思想,建立照明系统的初始结构。利用光学设计软件Zemax对照明系统光学初始结构进行优化,并在Lighttools中对该照明系统进行建模和大规模分布式光线追迹。追迹结果表明,在照明面积60mm×60mm范围内,照明不均匀度约为1.83%,照明功率密度不小于1.15mW·mm^(-2)。对照明面在光轴方向上的位移容差进行分析,结果表明该照明系统可以满足塔尔博特自成像光刻的需求。Based on optical design theory of imaging illumination and non imaging optical theory, an initial optical structure of illumination system is established according to the special requirements of Talbot self-imaging lithographic equipment. The optical design software Zemax is applied to optimize the initial structure. The software Lighttools is used to set up models and perform large-scale ray tracing. The simulation result shows that the nonuniformity of illumination approaches 1. 83% in the illumination area of 60 mm× 60 mm. Meanwhile, the power density is no less than 1. 15 mW·mm^-2. The tolerance analysis is carried out on the illumination system. The results show that the illumination system satisfies the demand of Talbot self-imaging lithography.

关 键 词：光学设计 光刻 照明系统 容差分析 塔尔博特自成像 

分 类 号：O439[机械工程—光学工程]