基于光诱导电化学沉积的金属微电极加工方法  

Fabrication of Metal Microelectrode Based on Optically Induced Electrochemical Deposition

作　　者：关涛[1,2] 丛培田[1] 刘柱[2] 

机构地区：[1]沈阳理工大学机械工程学院,沈阳110159 [2]中国科学院沈阳自动化研究所机器人学国家重点实验室,沈阳110016

出　　处：《传感技术学报》2017年第5期650-654,共5页Chinese Journal of Sensors and Actuators

基　　金：国家自然科学基金项目(51461165501;2015/01-2018/12)

摘　　要：纳米材料具有独特的物理化学性质,在纳米电子器件和生物传感等方面显示了巨大的应用潜力。基于二维纳米材料的器件,需要利用金属电极来构建传感器或者场效应晶体管结构。目前,已有一些方法来制备金属电极,如光刻、聚焦离子束及纳米压印等方法,但是这些方法通常需要昂贵的设备,并且操作非常复杂。提出采用基于光诱导的金属纳米电极沉积方法,通过对多个实验参数(包括输入交流电信号的频率、幅值、溶液浓度以及氢化非晶硅层厚度)的分析,得到了优化的金属电极沉积条件。在此基础上,利用光学显微镜、原子力显微镜和扫描电子显微镜对制备的金属电极进行了表征。Nanomaterials have unique physical and chemical properties, which have shown great potential in nano- electronic devices and nano-biosensors. Based on the two-dimensional nano-material devices, it is necessary to use the metal electrodes to create nano-sensors or field-effect transistor structures. At present, there are several methods to fabricate the metal electrodes such as lithography, focused ion beam （ FIB ） and nanoprinting. However, these methods often require the expensive equipments and are very complicated to operate. We propose a method of for the deposition of micro-electrodes, based on optically-induced metal electrodeposition. By analyzing the experimental parameters （ including the frequency, amplitude, solution concentration and thickness of hydrogenated amorphous silicon layer）, the optimized deposition conditions of the micro-electrodes were obtained. Then ,the prepared micro- electrodes were characterized by the optical microscope, atomic force microscope （AFM）and scanning electron microscope （ SEM ）.

关 键 词：光诱导电化学反应 金属微电极 原子力显微镜 电极沉积 

分 类 号：TP24[自动化与计算机技术—检测技术与自动化装置]