半导体芯片工艺节点演变路径分析  

Analysis of Process Roadmap on Semiconductor Chip Technology

作　　者：端点星 DUAN Dianxing(School of electronic engineering, Nanjing University, Jiangsu 210093, China.)

机构地区：[1]南京大学电子工程学院,江苏210093

出　　处：《集成电路应用》2017年第10期53-60,共8页Application of IC

基　　金：上海市软件和集成电路产业发展专项基金(2016.160505)

摘　　要：晶体管的缩小过程中涉及到三个问题。第一是为什么要把晶体管的尺寸缩小,以及是按照怎样的比例缩小的,这个问题是缩小有什么好处。第二是为什么技术节点的数字不能等同于晶体管的实际尺寸。或者说,在晶体管的实际尺寸并没有按比例缩小的情况下,为什么要宣称是新一代的技术节点。这个问题就是缩小有什么技术困难。第三是晶体管具体如何缩小。也就是,技术节点的发展历程是怎样的。在每一代都有怎样的技术进步。这也是真正的问题。在这里特指晶体管的设计和材料。The shrinking of the transistor involves three problems. The first is why the size of the transistor is shrunken and how scaled it is. What＇s the advantage of shrinking it？ Second is why the number of technical nodes can not be equal to the actual size of the transistor. Or, in the case that the actual size of the transistor is not scaled down, why should it claim to be a new generation of technology nodes？ The problem is to narrow down what technical difficulties there are. The third is how transistors shrink. That is what the development process of technology nodes is. What technological advances are there in every generation？ That＇s the real problem. Here is the characteristic the design and materials of transistors.

关 键 词：半导体芯片 工艺节点 尺寸缩小 纳米晶体管结构 

分 类 号：TN405[电子电信—微电子学与固体电子学]