不同基片掺杂氧化锌薄膜光学特性的对比研究  

Different Substrate of the Comparison of the Doped ZnO Thin Film Optical Properties

作　　者：徐飞 

机构地区：[1]贵州大学大数据与信息工程学院,贵阳550025

出　　处：《现代制造技术与装备》2017年第9期73-75,共3页Modern Manufacturing Technology and Equipment

摘　　要：本论文阐述了不同基片掺杂ZnO薄膜的各种生长技术及原理,在玻璃和硅的衬底上采用磁控溅射的方法沉积ZnO薄膜,并用光谱仪设备分析和表征了它的反射率、光致发光性能。结果显示,相同基底掺杂不同材料ZnO薄膜所对应不同波段的反射率和光致发光性质是不同的。例如,玻璃基底上掺钇ZnO薄膜在紫外线波段反射率较好;硅基底上掺镁ZnO薄膜在紫光波段反射率较好;红光波段掺镁ZnO薄膜所对应的峰的强度最大,所对应的光致发光性能好。In this paper,the fabrication principles of different substrate of the doped ZnO thin films were illustrated. ZnO thin films were achieved by magnetron sputtering deposition on glass and silicon substrate . Photoluminescence properties and reflectivity were analyzed and characterized by spectrometers equipment on the structure of ZnO thin film.The results show that the same doping ZnO thin films of different materials which correspond to different bands of the reflectance and photoluminescence property is different.For example, ZnO film is mixed yttrium by glass substrate,in ultraviolet rays band,which reflection rate is nice. ZnO film is mixed magnesium by silicon substrate,in violet band,which reflection rate is better. ZnO film is mixed magnesium in red band,and corresponds to peak of strengthmaximum,so photoluminescence property performs well.

关 键 词：磁控溅射 掺杂氧化锌薄膜 反射率 光致发光 

分 类 号：O484.41[理学—固体物理]