掺杂对MoS_2基薄膜微观结构及力学性能的影响  

Effect of doping on the microstructure and mechanical performance of MoS_2 based films

作　　者：于富成 张晓琴 柴利强[2] 许佼[2] 贺腾飞 王鹏[2] YU Fu-cheng ZHANG Xiao-qin CHAI Li-qiang XU Jiao HE Teng-fei WANG Peng(State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou Univ. of Tech. , Lanzhou 730050, China State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemic Physics, Chinese Academy of Sciences, Lanzhou 730000, China)

机构地区：[1]兰州理工大学省部共建有色金属先进加工与再利用国家重点实验室,甘肃兰州730050 [2]中国科学院兰州化学物理研究所固体润滑国家重点实验室,甘肃兰州730000

出　　处：《兰州理工大学学报》2017年第5期18-23,共6页Journal of Lanzhou University of Technology

基　　金：国家自然科学基金(51227804)

摘　　要：采用磁控溅射沉积技术制备Ti、Si、C和N掺杂的复合MoS_2薄膜,通过X射线能谱仪、扫描电子显微镜Xray衍射、拉曼光谱研究了不同掺杂元素对MoS_2基薄膜成分及微观组织结构的影响,利用纳米压痕仪、球盘式摩擦磨损实验机对比分析了掺杂金属元素及不同非金属元素对MoS_2薄膜力学性能和摩擦磨损性能的影响。结果表明:MoS_2薄膜中掺杂均可有效抑制MoS_2柱状晶的形成,N原子的添加抑制了MoS_2(002)晶面生长,薄膜向无定型结构转变;Ti原子的掺入使MoS_2薄膜硬度增加,且呈现出良好的摩擦磨损性能;非金属元素Si的掺入有效地提高了MoS_2薄膜硬度,但对薄膜的摩擦性能具有负面影响.The composite MoS2 films doped with Ti,Si,C and N elements were fabricated with magnetically-controlled sputtering technique.The influence of different doping elements on the composition,microstructure and morphology of MoS2-based films was analyzed by means of X-ray energy spectrometer,scanning electron microscope,X-ray diffraction and Raman spectroscopy.The influence of doped metallic and nonmetallic elements on mechanical and tribological wearing performance was comparatively analyzed with nano-indenter and standard ball-on-disk tribometer.The result showed that doping into MoS2 films could effectively inhibit the formation of columnar crystals.With the addition of N atom,the crystal face growth of MoS2 film at（002） would be inhibited and the film would change to one with amorphous structure.With the doping of Ti atom,the hardness of MoS2 film would increase,and the film would exhibit good frictional wearing performance.The doping of non-metallic elements Si would effectively improve the hardness of MoS2 film and would have a negative influence on its performance.

关 键 词：磁控溅射 MoS2复合薄膜 微观结构 摩擦磨损性能 

分 类 号：TG115.5[金属学及工艺—物理冶金]