Ni-Ti形状记忆合金电化学抛光工艺研究  

Electrochemical Polishing Process of Ni-Ti Shape Memory Alloy

作　　者：聂云聪 李志永[1] 严凤洁 魏修亭[1] 李丽[1] 

机构地区：[1]山东理工大学机械工程学院,山东淄博255049

出　　处：《材料保护》2017年第11期73-77,共5页Materials Protection

基　　金：山东省重点研发计划(公益类专项)项目(2017GGX30116)资助

摘　　要：为提高Ni-Ti形状记忆合金的表面质量,以Ti50.8Ni(原子分数,%)为基材进行纳米级电化学抛光加工试验。基于自行研制的电化学抛光加工系统及抛光液,通过正交试验和单因素试验,分析了电流密度、抛光时间、抛光温度、电极间距等因素对电化学抛光的影响程度及影响机理。采用Micro XAM-100白光干涉仪对抛光试样进行检测。结果表明:最佳抛光工艺为电流密度J=1.0 A/cm2、电极间距d=15 mm、抛光时间t=140 s、抛光温度θ=15℃。在最佳工艺参数下抛光质量良好,试件表面粗糙度值显著降低至27.8 nm,表面平整均匀、光亮如镜。In order to improve the surface quality of Ni-Ti shape memory alloy, Ti50.8Ni （atom fraction, %） was used as the substrate for nano-electroehemieal polishing proeessing test. The influence and mechanism of current density, polishing time, polishing temperature and electrode gap were analyzed by orthogonal test and single factor test, based on the self- developed electrochemical polishing system and the polishing solution. The polished specimens were tested by MicroXAM-100 white-light interferometer. Results showed that the optimum process- ing parameters were as follows： current density J = 1.0 A/cm2, electrode gap d = 15 mm, polishing time t = 140 s and polishing temperature 0 = 15℃. Under the optimum process parameters, the surface was smooth and bright and the roughness value was 27.8 nm.

关 键 词：电化学抛光 NI-TI合金 粗糙度 抛光液 工艺 

分 类 号：TG175[金属学及工艺—金属表面处理]