铋铁氧薄膜制备和应用研究进展  

Research Progress in Preparation and Application of Bismuth Ferrite Thin Films

作　　者：杨强[1] 王翼鑫 

机构地区：[1]长春大学,吉林长春130022

出　　处：《现代工业经济和信息化》2017年第21期62-63,80,共3页Modern Industrial Economy and Informationization

基　　金：吉林省教育厅十二五科学技术研究项目<多铁性BiFeO_3薄膜的制备及性能研究>(2014299);吉林省产业创新专项资金项目<新型太阳能电池纳米晶薄膜(CZTS)的制备及性质研究>(2017C052-3)

摘　　要：铋铁氧薄膜材料作为一种室温单项多铁材料,在微电子学、光电子学、磁性存储器件等领域具有广泛应用。综述了几种制备铋铁氧薄膜方法的研究进展,并重点介绍测控溅射的方法制备的铋铁氧薄膜在不同条件参数的情况下,研究进展和薄膜现阶段在应用方面的进展,并提出未来研究的方向。As a single multiferroic material at room temperature, bismuth ferrite thin films are widely used in microelectronics, optoelectronics, magnetic memory devices and other fields. In this paper, the research progress of several methods for preparing bismuth ferrite thin films is reviewed, and the progress of bismuth ferrite thin films prepared by magnetron sputtering under different conditions and the progress in the application of thin films at present are introduced, and the future research directions are proposed.

关 键 词：BiFeO3多晶薄膜 磁控溅射法 铁电 

分 类 号：TQ174[化学工程—陶瓷工业]