Notch槽晶向测试原理及方法  

Principle and Method of Notch Groove Crystal Orientation Test

作　　者：杨春颖[1] 吕菲[1] 

机构地区：[1]中国电子科技集团公司第四十六研究所,天津300220

出　　处：《电子工业专用设备》2017年第6期28-29,共2页Equipment for Electronic Products Manufacturing

摘　　要：在半导体材料加工过程中,Notch槽定位的精确度对后续加工成品率及最终产品性能有着重要的影响,准确测量Notch槽晶向显得尤为重要。主要介绍了利用X射线定向仪测试硅片Notch槽晶向的原理及方法 。In the process of semiconductor material processing, the accuracy of Notch positioning has an important influence on the subsequent processing yield and final product performance.It is particularly important to accurately measure the crystal orientation of Notch groove. This paper mainly introduces the principle and method of using X-ray orientator to test the orientation of Notch groove.

关 键 词：Notch槽 晶向 偏离度 

分 类 号：TN307[电子电信—物理电子学]