原子层沉积技术在纳米光子波导中的应用  

Application of Atomic Layer Deposition in Fabrication of Nanophotonic Silicon Slot Waveguides

作　　者：邵淑英[1] 易葵[1] 朱美萍[1] 范正修[1] 邵建达[1] 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800

出　　处：《真空科学与技术学报》2017年第12期1153-1159,共7页Chinese Journal of Vacuum Science and Technology

摘　　要：原子层沉积(ALD)是一种独特的薄膜沉积方法,能够实现完美的台阶复形和大面积均匀沉积,为薄膜成分和厚度提供原子级控制。本文将ALD的优点与纳米光子学联系起来,总结了ALD膜层在几种硅波导新结构中的性能优化作用,综述了近年来利用ALD制备纳米光子波导器件的一些研究成果。The latest advance infabrication of nanophotonic silicon slot waveguides by atomic layer deposition（ALD） was tentatively reviewed because ALD coatingis capable of synthesizing perfect stepped structures with atomic level controlled contents and thickness. The discussions with specific examples focused on： i） the ALD technical strengths,including but not limited to the good conformality with well-defined interface and well-controlled thickness,shrinking of feature size,reduction of transmission energy loss of waveguide,decrease of 3 rdorder nonlinearity,synthesis of nanostructured materials with favorable optical properties,and compatibility with slot photonic crystal waveguide; ii） the impact of the ALD coating on the optimization and improvement of the newly-developed Si slot waveguides; and iii） the recent results of filling the silicon slots waveguide with ALD-Ti O2. In addition,the development trends,technical problems and possible solutions of the ALD application in fabrication of nano-photonic waveguide were also briefly discussed.

关 键 词：原子层沉积 纳米光子学 槽波导 条形波导 环形谐振腔 

分 类 号：O484.4[理学—固体物理]