基于VirtualLab Fusion的原子光刻基片定位方案的光学系统仿真  

Simulation of optical system of substrate positioning scheme for atom lithography based on VirtualLab Fusion

作　　者：张宝武 霍剑锋 饶鹏辉 张明月 刘媛媛 余桂英 王道档 

机构地区：[1]中国计量大学计量测试工程学院,浙江杭州310018 [2]讯技光电科技(上海)有限公司,上海200092

出　　处：《中国计量大学学报》2017年第4期528-532,共5页Journal of China University of Metrology

基　　金：国家自然科学基金资助项目(No.61565004);广西高校光电信息处理重点实验开放基金资助项目(No.KFJJ2017-02)

摘　　要：为了探究原子光刻中基片与会聚激光场间距对沉积纳米光栅质量的影响,我们基于VirtualLab Fusion(VLF)平台实现了基片定位控制方案中光学系统的建模和仿真.结果显示:基片在切割会聚激光时将产生直边衍射图像,其轮廓形状和最大值都会随着基片切割激光截面区域大小的变化而变化:虚拟光电探测器上所得到的反射光强度值将随着基片-会聚激光间距的变化给出了倒置的高斯线型,其最低点出现在基片中心和会聚激光场轴线重合时的位置上.当会聚激光场截面恰好被基片阻挡一半时,探测处的强度值降至45.5%.这种光强随基片位置的变化情况为精确地定位基片位置提供了理论支撑.To study the effect of the distance between the substrate and the laser axis on the quality of nano grating deposited by atom lithography,the optical system of the substrate positioning scheme was simulated based on VirtualLab Fusion（VLF）.The results showed that when the substrate cut the laser,it would induce straight diffraction,whose profile and maximum value would be changed as the cutting area changed.The intensity on the virtual detector showed one inverted Gaussian profile as the space between the substrate and the laser axis changed.The minimum value of intensity was located at the position when the center of the substrate coincided with the laser axis.The intensity would decrease to 45.5% when the substrate cut half of the laser section.The results supply a theory to exactly locate the substrate in the focusing laser.

关 键 词：原子光刻 铬原子 会聚激光 VirtualLab Fusion平台 

分 类 号：O439[机械工程—光学工程]