机构地区:[1]北京大学口腔医学院·口腔医院修复科,北京100081 [2]北京大学口腔医学院·口腔医院综合二科、口腔数字化医疗技术和材料国家工程实验室、口腔数字医学北京市重点实验室,北京100081
出 处:《北京大学学报(医学版)》2018年第1期53-57,共5页Journal of Peking University:Health Sciences
摘 要:目的:研究不同表面处理对氧化锆与树脂水门汀粘接强度的影响。方法:将40个氧化锆试件随机分为4组,每组10个:对照组,无处理;喷砂组,用Al2O3颗粒对氧化锆试件表面均匀喷砂;紫外线(ultraviolet,UV)照射组,将氧化锆试件置于紫外线消毒箱中的紫外灯下方10 mm处照射48 h;低温等离子处理组,将氧化锆试件置于舱式低温等离子体发生器内处理30 s。分组处理后观察氧化锆试件表面形态,测量表面接触角及剪切粘接强度。结果:UV照射及低温等离子处理组氧化锆试件表面形态无明显改变,喷砂组氧化锆试件表面形态明显改变。喷砂组、UV照射组和等离子处理组氧化锆试件表面接触角分别为48.8°±2.6°、27.1°±3.6°和32.0°±3.3°,较对照组接触角(64.1°±2.0°)明显减小。喷砂处理组氧化锆试件剪切粘接强度(14.82±2.01)MPa大于对照组(9.41±1.07)MPa,差异有统计学意义(P<0.05)。UV处理组氧化锆试件剪切粘接强度(10.02±0.64)MPa大于对照组(9.41±1.07)MPa,但差异无统计学意义(P>0.05)。低温等离子处理后其剪切粘接强度(18.34±3.05)MPa大于对照组(9.41±1.07)MPa、喷砂处理组(14.82±2.01)MPa和UV处理组(10.02±0.64)MPa,且差异有统计学意义(P<0.05)。X射线光电子能谱分析(X-ray photoelectron spectroscopy,XPS)结果显示UV及低温等离子处理使氧化锆试件表面氧元素含量增加,碳元素含量减少,碳/氧比值减小。结论:UV照射及低温等离子处理均可在不改变氧化锆表面形态的基础上显著改善其表面的亲水性;UV照射后氧化锆与树脂的剪切粘接强度虽无明显提高,但试件断裂模式由粘接断裂向混合断裂转变;低温等离子处理能显著提高氧化锆与树脂水门汀的粘接强度。Objective: To evaluate the effects of different surface treatments on the shear bond strength between zirconia and resin cement. Methods: Forty zirconia discs were randomly divided into four groups (10 discs in each group) for different surface treatments : control, no surface treatment; sandblast, ap-plied air abrasion with aluminum oxide particles; ultraviolet ( UV) , the zirconia sample was placed in the UV sterilizer at the bottom of the UV lamp at 10 mm, and irradiated for 48 h; cold plasma, the discs were put in the cold plasma cabinet with the cold plasma generated from the gas of He for 30 s. Speci-mens of all the groups were surface treated prior to cementation with Panavia F 2. 0 cement. The surface morphology and contact angle of water were measured. The shear bond strengths were tested and the fai-lure modes were examined with a stereomicroscope. Results : Surface morphology showed no difference between the UV/cold plasma group and the control group. Sandblasted zirconia displayed an overall he-terogeneous distribution of micropores. The contact angle of the control group was 64. I 0 ± 2. 0o. After sandblasting, UV irradiation and cold plasma exposure, the values significantly decreased to 48. 80 士 2. 60,27. 10 ± 3.60 and 32. 09 ± 3. 30. The values of shear bond strength of the specimens with sand-blasted ( 14. 82 ±2. 01) MPa were higher than those with no treatment (9. 41 ± 1 . 07 ) MPa with statisti-cally significant difference ( P 〈 0. 05 ) . The values of shear bond strength of the specimens with UV irra-diation (10.02 ±0.64) MPa were higher than those with no treatment (9.41 ±1.07) MPa, but without statistically significant difference (P 〉0.05). The values of cold plasma group (18. 34 ±3. 05) MPa were significantly higher than those of control group (9.41 ±1. 07) MPa, even more than those withsandblast( 14. 82 ± 2. 01) MPa (P 〈0. 05) ? X-ray photoelectron spectrosc
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