NiO/Ag/NiO透明导电膜光电特性研究  

Optical and Electrical Properties of NiO/Ag/NiO Transparent Conductive Films

作　　者：孙阳 修显武[1] 何源[1] 王森 滕树云[1] 王书运[1] 

机构地区：[1]山东师范大学物理与电子科学学院,济南250358

出　　处：《真空科学与技术学报》2018年第1期27-32,共6页Chinese Journal of Vacuum Science and Technology

摘　　要：在室温条件下,利用磁控溅射法在玻璃衬底上制备了NiO/Ag/NiO透明导电膜,研究了不同NiO层和Ag层厚度对三层膜可见光透过率和电阻特性的影响。结果分析表明:制备的NiO/Ag/NiO为N型透明导电膜。在400~800 nm的可见光区域内,随着NiO和Ag层厚度的增加,薄膜的透光率先增大后减小。NiO层厚度为30 nm且Ag层厚度为11 nm时,叠层膜具有较好的光学特性,其最大透过率为84%,薄膜电阻为3.8Ω/sq,载流子浓度为7.476×1021cm-3。对薄膜透过率进行了计算机模拟,发现结果与实验中大致趋势相同,但因为折射率选择和薄膜界面等因素的影响,在可见光区域后半段实验值大于计算值。The NiO/Ag/NiO transparent conductive thin films were synthesized by magnetron sputtering at room temperature. The impact of the NiO and Ag layers thicknesses on the optical and electrical properties of the ntype NiO/Ag/NiO coatings were investigated with X-ray diffraction and atomic force microscopy. The preliminary results show that the thickness of NiO and Ag layers has a major impact. To be specific,as the thickness of both Ni O and Ag layers increased,the transmittance,in 400 ~ 800 nm visible range,changed in an increase-decrease mode.The Ni O（ 30 nm）/Ag（ 11 nm）/Ni O（ 30 nm） multilayers were found to have better properties,including the largest transmittance of 84%,a sheet-resistance of 3. 8 Ω/sq,and a carrier density of 7. 476 × 1021 cm-3. The small discrepancy between the measured and simulated transmittance in the posterior visible range possibly originated from the interface structures and refractive index approximation.

关 键 词：光电特性 透明导电膜 磁控溅射 复合材料 

分 类 号：O484.4[理学—固体物理]