基于LCC谐振逆变器的中频磁控溅射电源在等离子体镀膜工艺中的应用  

Application of intermediate frequency magnetron sputtering power source based on LCC resonant inverter in plasma coating process

作　　者：李民久 姜亚南[1] 贺岩斌 熊涛[1] 陈庆川[1] 

机构地区：[1]核工业西南物理研究院,四川成都610041

出　　处：《真空》2018年第1期35-39,共5页Vacuum

摘　　要：中频磁控溅射镀膜具有成膜均匀,膜重复性好,靶材不易中毒等诸多优点,适用于大规模生产,因此应用广泛。中频磁控溅射技术在电源的设计和应用方面非常重要,目前较为成熟的是正弦波和脉冲方波两种输出方式。本文阐述了正弦波输出方式的基于LCC谐振逆变器的中频磁控溅射电源的设计方法,并基于该电源的输出特性,分析该电源有利于提高镀膜工艺中的沉积效率,有利于抑制等离子体负载打弧,有利于等离子体负载特性匹配等优点。最后用正弦波输出方式的中频磁控溅射电源与脉冲方波输出方式的电源做了输出特性对比试验。Medium frequency magnetron sputtering has many advantages, such as uniform film formation, good film repetition, and not easy poisoning of target material. It is suitable for large-scale production and thus is widely used. The intermediate frequency magnetron sputtering technology is very important in the design and application of power supply. Currently, two kinds of output methods, sine wave and pulse square wave, are mature. This work presents a design method of LCC resonant inverter based on sine wave output. Based on the output characteristics of the power supply, the power analysis is helpful to improve the deposition efficiency in the coating process, inhibition of plasma load of arc striking, to match the load characteristics etc. Finally, the output characteristics of the intermediate frequency magnetron sputtering power supply with the sine wave output mode and the output power of the pulse square wave output method are compared.

关 键 词：中频磁控溅射 LCC 正弦波 等离子体 

分 类 号：TB43[一般工业技术] TP331[自动化与计算机技术—计算机系统结构]