深紫外非线性光学晶体材料:发展趋势和创新探索  

Deep-ultraviolet nonlinear optical materials: Development trend and innovative exploration

作　　者：盖敏强[1,2] 王颖 潘世烈[1] Minqiang Gai;Ying Wang;Shilie Pan(CAS Key Laboratory of Functional Materials and Devices for Special Environments, Xinjiang Key Laboratory of Electronic Information Materials and Devices, Xinjiang Technical Institute of Physics ＆ Chemistry, Chinese Academy of Sciences, Urumqi 830011, China;University of Chinese Academy of Sciences, Beijing 100049, China)

机构地区：[1]中国科学院新疆理化技术研究所新疆电子信息材料与器件重点实验室中国科学院特殊环境功能材料与器件重点实验室,乌鲁木齐830011 [2]中国科学院大学,北京100049

出　　处：《科学通报》2018年第11期998-1011,共14页Chinese Science Bulletin

基　　金：国家自然科学基金(51602341;51425206;91622107)资助

摘　　要：随着全固态激光技术在光通讯、光加工和光存储等领域的发展,深紫外非线性光学晶体材料成为目前国内外的研究热点.深紫外(λ<200 nm)非线性光学(NLO)晶体是获得全固态深紫外激光的必不可少的材料.目前仅有KBe_2BO_3F_2(KBBF)晶体能够实现Nd:YAG的直接六倍频深紫外激光(波长=177.3 nm)输出.然而,KBBF晶体存在难以克服的本征缺陷,如原料氧化铍有剧毒、晶体存在严重的层状生长习性,从而极大地制约了其商业化生产和应用进程.因此,世界各国科研机构都在积极探索发展新一代的深紫外NLO晶体材料.本文通过回顾深紫外NLO晶体的发展历程,总结近十年来该领域新材料的发展趋势,重点分析限制深紫外NLO晶体发展的主要因素,讨论目前发展深紫外NLO晶体材料的主要矛盾和解决策略,以期对未来新材料的创新探索提供借鉴.With the rapid development of all-solid-state laser technology in the field of optical communication, optical processing and optical storage, deep-ultraviolet（deep-UV, wavelengths below 200 nm） nonlinear optical（NLO） materials have become a hot topic at home and abroad. Coherent radiation in the deep-UV is possible with excimer lasers, e.g., F2 excimer at 157 nm. However, solid-state lasers in these wavelength ranges are often preferred owing to handling ease, narrow bandwidth, tunability, high energy density, and high peak power density. An excellent manner to generate coherent deep-UV light is through solid-state lasers using cascaded frequency conversion with NLO materials. Deep-UV NLO crystals, which can double the frequency of incident light to the deep-UV region, are essential for all-solid-state laser. The prerequisites for deep-UV NLO crystals are crystallographically noncentrosymmetric（NCS）, wide optical transparency window, large second harmonic generation（SHG） response, phasematching capability, and easy growth of large（centimeter size） high quality single crystals. For years, there has been a ＂200 nm wall＂, that is, no material is available for deep-UV SHG. Over the past decades, great efforts have been made on chemical design and synthesis of deep-UV NLO materials. Currently, only KBe2 BO3 F2（KBBF） crystal is capable for generating deep-UV light through direct sixth harmonic generation of the Nd：YAG laser. The infinite ∞[Be2 BO3 F2]-single layers in KBBF provide a relatively large SHG coefficient（d11=0.47 pm/V） and a sufficient birefringence（Δn=0.07@1064 nm）. However, the KBBF crystals have insurmountable intrinsic defects, such as the high toxicity of the beryllium oxide, and the serious layer growth habit, which greatly restrict its commercialization and application process. Therefore, researchers are actively exploring the next generation of deep-UV NLO materials. In this review, we will first briefly discuss the history of deep-UV NLO crystals. The main fa

关 键 词：深紫外 NLO晶体 KBBF 倍频效应 

分 类 号：O734[理学—晶体学]