工作参数对磁场增强高功率脉冲磁控溅射放电特性的影响  

Effect of Synthesis Conditions on Discharge Behavior of Magnetic Field Enhanced High Power Impulse Magnetron Sputtering

作　　者：李春伟[1,2] 田修波[2] 宋炜昱 赵美君 张旭 孙梦凡 白翔云 黄洁 梁家鹏 Li Chunwei;Tian Xiubo;Song Weiyu;Zhao Meijun;Zhang Xu;Sun Mengfan;Bai Xiangyun;Huang Jie;Liang Jiapeng(College of Engineering and Technology, Northeast Forestry University, Harbin 150040, China;State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)

机构地区：[1]东北林业大学工程技术学院,哈尔滨150040 [2]哈尔滨工业大学先进焊接与连接国家重点实验室,哈尔滨150001

出　　处：《真空科学与技术学报》2018年第4期264-271,共8页Chinese Journal of Vacuum Science and Technology

基　　金：东北林业大学大学生科研训练资助项目(KY2017016;KY2017017)

摘　　要：研究磁场增强高功率脉冲磁控溅射技术的放电特性在不同工作参数下的演变规律。利用数字示波器采集Hi PIMS的基体离子电流用于表征其放电特性的变化。结果表明:靶放电电压不同时基体离子电流对工作气压的响应不同,较低靶电压时基体离子电流平均值随工作气压的增加逐渐增加;而较高靶电压时基体离子电流平均值随工作气压增加迅速增加后趋于稳定。基体离子电流随基体偏压的变化表现出两个特征,较低基体偏压时的基体离子电流在脉冲开始阶段呈现出较强的电子流波段,而基体偏压较高时则未出现电子流。不同脉冲频率及靶电压下的基体离子电流的波形形状大致相似,但当处于较高靶电压时存在一个明显特征,即当脉冲结束后离子流会出现一个尖锐峰值。随脉冲宽度的增加,基体离子电流负向电子流和正向离子流均逐渐增大。We reported the influence of the deposition conditions, including but not limited to the pressure, pulse frequency, bias and target voltages, on the evolution of discharge properties of magnetic field enhanced high power impulse magnetron sputtering （HiPIMS）. The results show that the coating conditions all have a major im- pact. For example, at a low target voltage, the average substrate ion current increased with the increasing pressure;at a high target voltage, the ion current changed in a mode of rapid increase and slow level-off. At a low bias voltage, a strong electron current wave-shape showed up only in pulse rising edge. The pulse frequency and target voltage litde affected the ion current wave-shape except that at a high target voltage an ion current spike appeared in pulse descending edge. As the pulse width increased, the negative electron current and oositive ion current increased.

关 键 词：高功率脉冲磁控溅射 磁场 工作气压 基体偏压 靶基间距 脉冲频率 脉冲宽度 

分 类 号：TG174.444[金属学及工艺—金属表面处理]