沉积温度对MOCVD制备ZnO纳米薄膜性质的影响  

Effect of deposition temperature on properties of ZnO nano-film fabricated with MOCVD

作　　者：于富成[1] 李海山 胡海龙[1] 宋天云 许博宇 何玲[1] YU Fu-cheng, LI Hai-shan, HU Hai-long, SONG Tian-yunXU Bo-yu, HE Ling(College of Materials Science and Engineering, Lanzhou Univ. of Tech., Lanzhou 730050, Chin)

机构地区：[1]兰州理工大学材料科学与工程学院,甘肃兰州730050

出　　处：《兰州理工大学学报》2018年第3期30-33,共4页Journal of Lanzhou University of Technology

基　　金：甘肃省自然科学基金(1506RJZA107)

摘　　要：采用金属有机化学气相沉积(MOCVD)法在石英衬底上制备了ZnO纳米薄膜,考察了不同沉积温度对ZnO薄膜结构及光学性质的影响.结果表明:所有样品均表现出C轴择优的六角纤锌矿结构.随着沉积温度由700℃升高至800℃时,ZnO薄膜的半峰宽逐渐变窄,晶粒尺寸逐渐增大,光致发光强度逐渐增强,表明沉积温度的升高有利于晶体的生长.当沉积温度由800℃继续升高后,样品的半峰宽变宽,晶粒尺寸减小,光致发光强度降低,表明沉积温度过高产生热缺陷,不利于晶体的生长.ZnO nano-films were prepared on quartz substrates by means of metal organic chemical vaporphase deposition（MOCVD）.The effect of deposition temperature on the structure and optical properties of the ZnO films was investigated.The result showed that all the samples were of wurtzite structure with Caxis as preferred orientation.With the increasing of deposition temperature from 700 ℃ to 800 ℃,the Full-Width Half-Maximum（FWHM）of ZnO film would narrow gradually,the grain size would increase gradually,and the photo induced luminancy would be enhanced,manifesting that the increase of deposition temperature would be beneficial to the growth of the grains.When the deposition temperature was over800 ℃,the FWHM of XRD pattern of the specimen would become wide,the grain size would decrease,and the photo induced luminancy would lower,manifesting that the excessive deposition temperature would lead to a thermal defects,which would be unfavorable to grain growth.

关 键 词：金属有机化学金相沉积 化学气相沉积法 ZnO纳米薄膜 沉积温度 

分 类 号：TB34[一般工业技术—材料科学与工程]