基片温度对真空蒸镀Ti/LiNbO_3光学薄膜的影响  

Effect of Substrate Temperature on Vacuum Deposition of Ti/LiNbO_3 Composite Optical Films

作　　者：汤卉[1] 董鹏展 吕杨[1] TANG Hui;DONG Pengzhan;LV Yang(College of Materials Science and Engineering,Harbin University of Science and Technology,Haerbin 150040,China)

机构地区：[1]哈尔滨理工大学材料科学与工程学院,黑龙江哈尔滨150040

出　　处：《徐州工程学院学报（自然科学版）》2018年第3期18-21,共4页Journal of Xuzhou Institute of Technology(Natural Sciences Edition)

基　　金：黑龙江省科学基金项目(E201130)!

摘　　要：利用绿色真空蒸镀技术,在不同LiNbO_3基片温度下制备Ti光学薄膜,研究不同LiNbO_3基片温度对Ti光学薄膜生长过程的影响,结合薄膜生长与原子迁移理论分析影响机理,优化基片温度.对样品表观形貌与薄膜、晶粒择优生长趋向进行分析.研究结果表明:180℃为5组温度中最合适的基片温度.此条件下,钛薄膜表面存在大量细晶,分布均匀,无晶界迁移,晶粒随机生长、尺寸小,无针孔,钛薄膜表面粗糙度(Rq)低,为25.4nm,平整度较理想,为后续钛扩散铌酸锂光耦合器的制备提供了保障.With the help of green vacuum deposition technology,Ti/LiNbO3 composite optical films were prepared with different temperature of LiNbO3 substrate,whose effects on the growth process were also studied.The mechanism of film growth and atomic mobility theory was analyzed to optimize the substrate temperature.The apparent morphology of the samples and the preferential growth tendency of films and grains were analyzed.The results show that 180 °C is the most suitable substrate temperature in 5 groups of temperature.Under this condition,the surface of titanium film is distributed with small sized fine grains without boundary migration or pinholes and grows randomly.The surface roughness （Rq） of the titanium film is low to 25.4 nm with ideal flatness,which provides a guarantee for the subsequent preparation of the titanium diffusion lithium niobate optical coupler.

关 键 词：真空蒸镀 Ti光学薄膜 基片温度 

分 类 号：O484[理学—固体物理]