退火温度对电子束沉积Ag/TiO_2薄膜光学性质和光催化性能的影响  

Effects of air annealing temperature on optical and photocatalytic performance in electron beam evaporated Ag/TiO_2 thin films

作　　者：郝殿中[1] 张霞[1] 韩培高[1] 牛明生[1] HAO Dian-zhong;ZHANG Xia;HAN Pei-gao;NIU Ming-sheng(Shandong Provincial Key Laboratory of Laser Polarization and Information Technology,Institute of Laser Research,Qufu Normal University,Qufu 273165 China)

机构地区：[1]曲阜师范大学激光研究所山东省激光偏光与信息技术重点实验室,山东曲阜273165

出　　处：《光电子．激光》2018年第9期969-974,共6页Journal of Optoelectronics·Laser

基　　金：山东省自然科学基金(ZR2015AM024)资助项目

摘　　要：研究了退火温度对电子束制备Ag/TiO_2薄膜光学性质和光催化性能的影响。在石英玻璃、硅片上沉积了Ag/TiO_2复合薄膜,在空气氛围下,进行了400℃,500℃,600℃的退火一小时.用紫外-可见分光光度计、X射线衍射仪(XRD)、原子力显微镜(AFM)对沉积和退火后的薄膜分别进行光学、结构、形貌分析。结果表明:300℃下制备的Ag/TiO_2复合薄膜为无定形结构,400℃-600℃以上薄呈多晶态。吸光度和表面粗糙度随退火温度的增加而增大,薄膜的光学带隙随退火温度的增加而减小。锐钛矿相表现出了更好的光催化性能。This paper presents the effect of annealing temperature on the optical pro perties and photocatalytic ability of electron beam evaporated Ag/TiO2thin films.The films were deposited employ ing electron beam evaporation technique on fused silica and Si substrates followed by thermal annealing in air atmosphere at temperature 400℃,500℃ and 600℃ for 1h.The films UV-vis sp ectropho-tometry X-ray diffraction （XRD）,atomic force microscope （AFM） are use d to find the optical,structural,morphological analysis of as-deposited and ann ealed films respectively.Results indicate tha t the as-deposited films at （300℃） have amorpho us nature while films annealed at 400℃-600℃ show polycrystalline in nature.The optical absorbance and surface roughness are increased with increase of annealing temperature,while optical energy band gap is decrease d.Anatase phase presents better photocatalytic performance.

关 键 词：银掺杂二氧化钛 退火温度 光催化 薄膜 电子束沉积技术 微结构 带隙 光学性能 

分 类 号：O643[理学—物理化学]