反应溅射制备Ni_xO_y薄膜的形貌与成分分析及其电致变色性能  

Morphology, Constituents and Electrochromic Performance of Ni_xO_y Thin Films Derived by Reaction Sputtering Method

作　　者：彭寿 汤永康 金良茂 马立云 甘治平 金克武 王天齐 李刚 PENG Shou;TANG Yongkang;JIN Liangmao;MA Liyun;GAN Zhiping;JIN Kewu;WANG Tianqi;LI Gang(State Key Laboratory of Advanced Technology for Float Glass,Bengbu Design ＆ Research Institute for Glass Industry,Benghu 233000,Anhui,China)

机构地区：[1]中建材蚌埠玻璃工业设计研究院有限公司浮法玻璃新技术国家重点实验室

出　　处：《硅酸盐学报》2018年第10期1347-1354,共8页Journal of The Chinese Ceramic Society

基　　金：安徽省重点研究与开发计划项目(1804a09020061);安徽省科技攻关计划项目(1704a0902010);安徽省科技重大专项(17030901085)项目

摘　　要：采用直流反应磁控溅射法制备了具有不同电致变色性能的NixOy薄膜。通过X射线衍射（XRD）、X射线光电子能谱（XPS）、场发射扫描电子显微镜、电化学工作站、紫外-可见-红外分光光度计研究了薄膜物相、价态组成、微观结构和电致变色性能。研究表明：金属镍靶直流反应溅射所制备的薄膜结晶状态与表面微结构对氧流量反应敏感,即在很小的氧流量变化范围内薄膜呈现出不同的晶相与表面形貌;氧化镍薄膜在不同的制备条件下展现出了独特的表面微结构,XRD结果显示薄膜成分为NiO,而通过薄膜元素XPS分析发现其中的Ni并非只有单纯的二价,三价的Ni亦存在,且Ni2＋/Ni^3＋之比约为2：1。最终氧流量、溅射压强、溅射功率分别为1.6 mL/min、2.0 Pa、50 W时获得较优变色性能的NixOy薄膜,其可见光区最大电致变色幅度达到约55%。NixOy thin films with various morphology and intriguing electrochromic performance were prepared by reaction sputtering method. The phase, valence components, microstructure and electrochromic properties of NixOy films were investigated by X-ray diffraction（XRD）, X-ray photoelectron spectroscopy（XPS）, field emission scanning electron microscopy（FESEM）, electrochemical workstation and ultraviolet-visible-infrared spectrophotometer, respectively. The results show that the phase and microstructure prepared using Ni target are rather sensitive to the O flow, diversified crystalline state and morphology of the film exhibit even in the narrow O flow range. Intriguing morphology are presented under different preparing conditions. Based on XRD patterns, the crystal phase of films is absolutely NiO. The XPS results indicate that the films are composed of NiO and Ni2O3, and the element ratio of Ni2＋ and Ni^3＋ is about 2：1. The films with a better electrochromic performance（i.e., the discoloration rate in the visible light wavelength of 55%） are prepared at the O flow of 1.6 mL/min, sputtering pressure of 2.0 Pa and sputtering power of 50 W.

关 键 词：氧化镍薄膜 表面微结构 价态组成 电致变色 

分 类 号：TB34[一般工业技术—材料科学与工程]