MPCVD制备大面积自支撑金刚石膜研究进展  

RESEARCH PROGRESS IN THE LARGE-AREA FREESTANDING DIAMOND FILMS BY MPCVD

作　　者：刘辉[1] 汪建华[1] 翁俊[1] 陈义 吴骁[1] LIU Hui;WANG Jian-hua;WENG Jun;CHEN Yi;WU Xiao(Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,Wuhan Institute of Technology,Wuhan 430073,China)

机构地区：[1]武汉工程大学湖北省等离子体化学与新材料重点实验室,武汉430073

出　　处：《真空与低温》2016年第6期319-323,330,共6页Vacuum and Cryogenics

基　　金：国家自然科学基金(No.11175137);武汉工程大学教育创新基金(No.CX2015025)

摘　　要：金刚石膜因其优异的物理化学性质备受关注,而大面积自支撑金刚石膜因其结构完整性在各大领域的应用范围更胜一筹。综述了大面积自支撑金刚石膜的、研究进展和影响其沉积均匀性和沉积速率的因素。表明微波频率越高,沉积速率越快;而气体流速对沉积速率的影响呈现先增大后减少的趋势;基片台的设计对金刚石的均匀性至关重要;辅助气体对金刚石膜的影响与添加的气体种类有关,微量N_2、O_2的加入可以提高沉积速率。最后对大面积自支撑金刚石在红外窗口的应用进行展望。The diamond films is becoming focus in recent years because of their outstanding physical and chemical properties,whereas,the large-area freestanding diamond films have a wilder application in all fields,owing to their structural integrity. In this paper,the research progress and factors which determines the growth uniformity and growth rates of the large-area freestanding diamond films are outlined. Experiments showed that,the higher the microwave frequency is,the faster deposition rate will be; the influence of gas flow rate on the deposition rate has a tendency of decrease after increasing;the design of substrate holders is important to the uniformity of diamond films,the influence of auxiliary gas on diamond films depends on gas species; the addition of traces N2,O2 can increase the deposition rate. Besides,the applications of the large-area freestanding diamond films in IR windows are prospected.

关 键 词：金刚石膜 大面积 自支撑 均匀性 沉积速率 

分 类 号：TB321[一般工业技术—材料科学与工程]