TiO_2膜层制备参数对Ag/TiO_2复合膜隔热性能的影响  

Influences of TiO_2 Film Preparation Parameters on Thermal Insulation Properties of Ag/TiO_2 Composite Films

作　　者：丁泽良[1] 杨益辉 张诗淼[1] 王双雄 DING Zeliang;YANG Yihui;ZHANG Shimiao;WANG Shuangxiong(School of Mechanical Engineering,Hunan University of Technology,Zhuzhou Hunan 412007,China)

机构地区：[1]湖南工业大学机械工程学院,湖南株洲412007

出　　处：《包装学报》2017年第3期25-30,共6页Packaging Journal

基　　金：湖南省自然科学基金资助项目(2015JJ5019);湖南省研究生科研创新基金资助项目(CX2015B565)

摘　　要：采用磁控溅射工艺制备玻璃基Ag/TiO_2复合膜,研究TiO_2膜的射频功率、溅射时间、氩气流量和本底真空度4个制备参数对复合膜隔热性能的影响。结果表明:复合膜的隔热温差随着射频功率、溅射时间、氩气流量、本底真空度的增加均呈现先增大后减少的变化趋势;4个制备参数对复合膜隔热温差的影响程度由大到小的顺序依次为本底真空度、溅射时间、射频功率、氩气流量;4个制备参数的较优组合为本底真空度4×10^(-3) Pa,射频功率150 W,溅射时间15 min,氩气流量20 m L/min。The Ag/TiO2composite film was prepared on glass substrate by magnetron sputtering,while theinfluences of TiO2film preparation parameters,including sputtering power,sputtering time,argon flow and vacuumdegree on thermal insulation of Ag/TiO2films were studied.Results showed that the temperature difference in thermalinsulation firstly increased and then decreased with the increase in RF sputtering power,sputtering time,argon flowand vacuum degree.In terms of influence of the parameters on the temperature difference of the composite film,theimportance degree in descending order was vacuum background,sputtering time,RF power,argon flow rate.Theoptimal combination of the four preparation parameters was with background vacuum of4×10-3Pa,radio power of150W,sputtering time of15min and argon flow of20mL/min.

关 键 词：Ag/TiO2膜 磁控溅射 隔热性能 制备参数 

分 类 号：O484[理学—固体物理]