全息光刻制备LC-DFB及光栅刻蚀优化（英文）  

Laterally-coupled distributed feedback lasers with optimized gratings by holographic lithography etching

作　　者：李欢 杨成奥 谢圣文 黄书山 柴小力 张宇[2,3] 王金良 牛智川[2,3] LI Huan;YANG Cheng-Ao;XIE Sheng-Wen;HUANG Shu-Shan;CHAI Xiao-Li;ZHANG Yu;WAGN Jin-Liang;NIU Zhi-Chuan(School of Physics and Nuclear Energy Engineering,Beihang University,Beijing 100191,China;State Key Laboratory for Supperlattices and Microstructures,Institute of Semiconductors Chinese Academy of Sciences,Beijing 100083,China;Synergetic Innovation Center of Quantum Information and Quantum Physics, University of Science and Technology of China,Hefei 230026,China)

机构地区：[1]北京航空航天大学物理科学与核能工程学院,北京1000191 [2]中国科学院半导体研究所超晶格实验室,北京100083 [3]中国科学技术大学量子信息与量子科技前沿协同创新中心,安徽合肥230026

出　　处：《红外与毫米波学报》2018年第2期140-143,153,共5页Journal of Infrared and Millimeter Waves

基　　金：Supported by National Natural Science Foundation of China(61435012,61290303);the National 973 program(2014CB643903,2013CB932904)

摘　　要：成功制备出室温激射波长为2μm的Ga Sb基侧向耦合分布反馈量子阱激光器.采用全息曝光及电感耦合等离子体刻蚀技术制备二阶布拉格光栅.优化了光栅制备的刻蚀条件,并获得室温2μm单纵模激射.激光器输出光功率超过5 m W,最大边模抑制比达到24 d B.GaSb-based laterally coupled distributed feedback(LC-DFB)quantum well lasers with a wavelength of 2μm were successfully prepared.Second order Bragg gratings are fabricated by holographic lithography and inductively coupled plasma etching(ICP).The etching conditions for grating preparation are optimized and a single longitudinal mode lasing at room temperature is obtained.The room temperature peak power output per facet exceeds 5 mW with a maximum side-mode suppression ratio of more than 24 dB.

关 键 词：镓锑基 侧向耦合分布反馈 LC-DFB 全息光刻 二阶布拉格光栅 

分 类 号：O43[机械工程—光学工程]