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作 者:毕丹丹 张立超[1,3] 时光 BI Dan-dan;ZHANG Li-chao;SHI Guang(Engineering Research Center of Extreme Precision Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130039,China;;University of Chinese Academic of Sciences,Beijing 100049,China;Changchun National Extreme Precision Optics Co.Ltd.,Changchun 130039,China)
机构地区:[1]中国科学院长春光学精密机械与物理研究所超精密光学工程研究中心,吉林长春130039 [2]中国科学院大学,北京100049 [3]长春国科精密光学技术有限公司,吉林长春130039
出 处:《中国光学》2018年第5期745-764,共20页Chinese Optics
基 金:国家科技重大专项资助项目(No.2009ZX02205)~~
摘 要:深紫外光刻是目前集成电路制造的主流方法,为实现更小的元件特征尺寸,必须采用浸没式投影物镜以提高光学系统的分辨率,由此向其中的薄膜光学元件提出了众多苛刻的要求。本文介绍了适用于浸没式光刻系统的薄膜材料及膜系设计,以及高NA光学系统所需的大角度保偏膜系;对物镜中最关键的浸液薄膜的液体环境适应性、疏水及防污染等关键问题进行了讨论;对衡量浸没式光刻系统性能的重要因素镀膜元件激光辐照寿命,尤其是浸液环境下的元件辐照寿命进行了分析。The deep ultraviolet lithography is currently a main method for integrated circuit manufacture.The immersive projection objective must be used to increase resolution of the optical system for realization of smaller component feature dimensions.Therefore a number of rigorous requirements for optical coating component are put forward.In this paper we present designs of the film material and film system applicable to immersive lithographical system as well as the large angle polarization-maintaining film system required for optical systems at high NA.Key issues about immersion environment adaptability,hydrophobicity and anti-contamination of the immersion coating most critical to the objective are discussed.Laser irradiation lifetime of the coated components especially in the immersion environment that is an important factor to evaluate performance of the immersive lithographical system is analyzed.
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