磁控溅射功率对玻璃基DLC薄膜的结构和硬度的影响  

Effects of Sputtering Power on Structure and Hardness of DLC Thin Films Deposited on Glass Substrates

作　　者：刘翔[1] 赵青南[1,2] 张泽华 李渊 曾臻 董玉红 赵杰 LIU Xiang;ZHAO Qing-nan;ZHANG Ze-hua;LI Yuan;ZENG Zhen;DONG Yu-hong;ZHAO Jie(State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology,Wuhan 430070,China;Jiangsu Xiuqiang Glasswork Co.Ltd.,Suqian 223800,China)

机构地区：[1]武汉理工大学硅酸盐建筑材料国家重点实验室,武汉430070 [2]江苏秀强玻璃工艺股份有限公司,宿迁223800

出　　处：《硅酸盐通报》2018年第10期3049-3053,共5页Bulletin of the Chinese Ceramic Society

基　　金：国家“十三五”重点研发计划子课题(2016YFB0303903-04)。

摘　　要：用直流-射频磁控溅射镀膜工艺,在不同的溅射功率条件下,制备了玻璃/Si C/DLC(diamond-like carbon)薄膜。通过X射线衍射仪(XRD)、共焦显微拉曼光谱仪(Raman)、场发射扫描电子显微镜(SEM)、纳米显微硬度仪,研究了DLC薄膜的组织结构、物相组成、表面形貌、维氏硬度。结果表明,随着功率的增大,ID/IG值先增大后减小,薄膜硬度呈现先增大后减小的趋势;当溅射功率为200 W时,ID/IG值为0. 56,镀膜玻璃的硬度值最大(830HV),相比未镀膜的玻璃基片,硬度值增加了23. 88%。Diamond/SiC/DLC thin films were deposited under different sputtering power ratio by DC/RF magnetron sputtering.The structures,phase composition,surface morphology and Vickers hardness of DLC films were researched by X-ray diffraction(XRD),confocal microscopy Raman spectroscopy(Raman),field emission scanning electron microscopy(SEM)and nanometer microhardness tester.The results show that the ID/IG value increases first and then decreases with the increase of power,and the hardness of the film increases first and then decreases.When the sputtering power is 200 W,the ID/IG value is 0.56,DLC coated glass with the maximum hardness(830 HV),compared to the uncoated glass substrate,the hardness value increased by 23.88%.

关 键 词：DLC薄膜 硬度 磁控溅射功率 过渡层SiC 

分 类 号：TQ171[化学工程—玻璃工业]