蒸发诱导纳米粒子自组装薄膜制备工艺  

Evaporation-induced Self-assembly Process for Preparation of Nanoparticles Thin Film

作　　者：黎相孟 祝锡晶[1] 魏慧芬 崔学良 冯昕宇 LI Xiang-meng;ZHU Xi-jing;WEI Hui-fen;CUI Xue-liang;FENG Xin-yu(School of Mechanical Engineering,North University of China,Taiyuan 030051,China;School of Mechanical Engineering School of Instrument and Electronics,North University of China,Taiyuan 030051,China)

机构地区：[1]中北大学机械工程学院,太原030051 [2]中北大学仪器与电子学院,太原030051

出　　处：《科学技术与工程》2019年第5期129-135,共7页Science Technology and Engineering

基　　金：国家自然科学基金(51705479);山西省青年科技基金项目(201701D221128)资助

摘　　要：为了获得高质量的单层纳米粒子薄膜,提出一种移动盖板约束下的蒸发诱导纳米粒子自组装工艺方法;研究了纳米粒子悬浮液浓度、基材温度、间隙高度和盖板速度等工艺要素对二氧化硅纳米粒子薄膜结构成形形貌的影响规律。结果表明,在适当的悬浮液浓度、基材温度和盖板移动速度等条件下,可以获得高质量的致密单层二氧化硅纳米粒子薄膜,典型的优化工艺参数为:纳米粒子悬浮液浓度5 g·L^(-1),间隙高度1 mm,盖板移动速率110μm·s^(-1),以及温度30℃。Evaporation-induced self-assembly process under mobilized geometric confinement was proposed, so as to obtain a high quality monolayer of nanoparticle films. The effect was investigated of the suspension concentration of nanoparticle, temperature of the substrate, height of clearance, and the cover speed, on the formation morphologies of the silica nanoparticle films. The results reveal that, high quality nanoparticle films of close-packed monolayer can be obtained under proper conditions of suspension concentration, substrate temperature and the cover speed, so and forth. A group of typical optimized parameters are as follows, including concentration of 5 g ·L^-1 , height of 1 mm, cover speed of 110 μm ·s^-1 , and temperature of 30 ℃.

关 键 词：二氧化硅纳米粒子 薄膜 蒸发诱导自组装 几何约束 

分 类 号：TH162[机械工程—机械制造及自动化]