Preparation of Double-sided Nanostructure Based on Soft-nanoimprinting Lithography  

作　　者：Man Zhang Qiling Deng Hui Pang Lifang Shi Axiu Cao 

机构地区：[1]Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu,China,610209

出　　处：《Journal of Microelectronic Manufacturing》2018年第2期1-5,共5页微电子制造学报（英文）

基　　金：the National Nature Science Foundation(No.61605211)of China;Science and Technology Support Program of Sichuan province(No.2016RZ0067).

摘　　要：Double-sided nanostructure has more excellent properties in high efficiency,high yield,and high capability devices,which becomes the attention spots in nanofabrication technology.We proposed a very simple method to fabricate the double-sided nanostructure on polymer elastic substrate.By using twice soft-nanoimprinting process,the same or different nanostructures array was fabricated onto the elastomeric slab substrate.In this paper,we fabricated double-sided nanopillars array with different diameters of 200nm and 350nm.In order to expand the applications field in optical and electronic devices,metal layer could be deposited onto the substrate before imprinting nanostructure.

关 键 词：Double-sided NANOSTRUCTURE ELASTIC SUBSTRATE soft-nanoimprinting LITHOGRAPHY metal layer 

分 类 号：TN[电子电信]