薄膜光学微金字塔结构阵列的制备研究  

Preparation of Thin Film Optical Micropyramid Structures Array

作　　者：葛少博 刘卫国 周顺 李世杰 黄岳田 GE Shaobo;LIU Weiguo;ZHOU Shun;LI Shijie;HUANG Yuetian(Shaanxi Province Key Laboratory of Thin Films Technology andOptical Test,School of Photoelectric Engineering,Xi’an Technological University,Xi’an 710021,China;Institute of Optics and Electronics Chinese Academy Science,Chengdu610209,China)

机构地区：[1]西安工业大学光电工程学院/陕西省薄膜技术与光学检测重点实验室,西安710021 [2]中国科学院光电技术研究所,成都610209

出　　处：《西安工业大学学报》2019年第3期253-259,265,共8页Journal of Xi’an Technological University

基　　金：国家基础研究项目(JCKY2016208A002);陕西省教育厅重点实验室科研计划项目(16JS039);先进制造项目(41423020111)

摘　　要：为了解决薄膜光学微结构中等效折射率梯度分布的问题。本文研究了轮廓渐变的薄膜微金字塔结构阵列,分析了微金字塔结构的典型制备工艺,提出了一种单点金刚石车削,结合纳米压印与电感耦合等离子体刻蚀技术的制备方法。实验结果表明:单点金刚石飞切形成的金字塔结构单元的尺寸可以在1~10μm之间进行调控,切削5min可以形成直径12.5mm的微结构成型区域;纳米压印技术与电感耦合等离子体刻蚀方法的结合,实现了薄膜光学微金字塔结构阵列的制备。The study is intended to discuss the equivalent refractive index gradient distribution in the thin film optical microstructures.Based on the study of thin film optical micropyramid structures array with contour gradients and the analysis of the typical preparation process of the micropyramid structure,a preparation process of single point diamond turning is proposed,in combination with nanoimprint lithography and inductively coupled plasma etching.Experimental results show that the size of the pyramidal unit formed by single point diamond fly cutting can be adjusted between1 μm and10 μm and that a microstructured molding area with a diameter of12.5 mm can be formed in 5 min.The thin film optical micropyramid structures array is prepared by the method which combines nanoimprint lithography with inductively coupled plasma etching technology.

关 键 词：微金字塔结构 等效折射率 单点金刚石车削 纳米压印 电感耦合等离子体刻蚀 

分 类 号：O484.1[理学—固体物理]