基于MVC架构的CMP软件模块开发研究  

CMP Software Module Development Research Based on MVC

作　　者：孔宪越 孟晓云 杨元元 KONG Xianyue;MENG Xiaoyun;YANG Yuanyuan(The 45^th Research Institute of CETC,Beijing 100176,China)

机构地区：[1]中国电子科技集团公司第四十五研究所

出　　处：《电子工业专用设备》2019年第3期25-28,共4页Equipment for Electronic Products Manufacturing

摘　　要：针对化学机械抛光技术(CMP)软件系统复杂、工艺控制种类繁多、运行参数数据量大等问题,提出将MVC(Model-View-Controller)架构应用于CMP软件设计的方法;阐述了MVC架构在CMP软件设计中的应用以及在事件管理程序设计(模块3)和信息筛选中的应用;基于MVC架构的软件设计方法降低了软件模块之间的耦合性,提高了程序的复用性和可维护性。For Chemical Mechanical Polishing technology (CMP) has the problems of complex software structure,variety of process control,and large amount of data for operation parameters,MVC (Model View Controller) framework is applied to CMP software design in this paper.The CMP software design method using MVC framework is proposed.Besides,the application of MVC in program design and information filtering for Event Manager (System 3) is presented in detail.CMP Software design method based on MVC framework reduces the coupling between software modules,and improves the reusability and maintainability.

关 键 词：化学机械抛光 模型-视图-控制器架构 软件设计方法 

分 类 号：TP311[自动化与计算机技术—计算机软件与理论]