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作 者:鞠量 彭斌[1] 黄和 曾慧中[1] 张万里[1] JU Liang;PENG Bin;HUANG He;ZENG Huizhong;ZHANG Wanli(State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 611731,China)
机构地区:[1]电子科技大学电子薄膜与集成器件国家重点实验室
出 处:《测试技术学报》2019年第4期365-368,共4页Journal of Test and Measurement Technology
基 金:国家重点研发计划资助(2017YFB0406400)
摘 要:根据近场微波测试原理搭建了一套近场扫描微波显微镜系统,在不同针尖-样品距离情况下,测试了宽度分别为260μm和470μm的NiFe薄膜在宽度方向的轮廓,研究结果表明,随着针尖-样品距离的增加,测试的空间分辨率降低.通过对扫描得到的轮廓曲线进行分析,发现测试得到的薄膜线宽随针尖-样品距离的增大而线性增加.结合近场微波领域的基本理论,提出了一种获得薄膜真实线宽的测试方法,为近场扫描微波显微镜的进一步研究奠定了基础.Based on the principle of near-field microwave measurement, we have built a near-field scanning microwave microscopy system. We measured the profiles of NiFe thin films with width of 260 and 470 microns under different tip-to-sample distances. The results show that, with the increase of measuring height, the spatial resolution of the system decreases. Through the analysis of the profile curve, it is found that the line width of the film increases linearly with the increase of the distance between the tip and the sample. Based on the basic theory of near-field microwave, a measurement method for the linewidth of thin films was proposed, which lays a foundation for further study of near-field scanning microwave microscopy.
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