基于磁控溅射靶的磁场分布优化  

Optimization of Magnetic Field Distribution based on Magnetron Spatteing Targets

作　　者：石晓倩 于荣环 乌云额尔德尼 臧侃[1] 郭方准[1] SHI Xiaoqian;YU Ronghuan;Oyunerdene;ZANG Kan;GUO Fangzhun(School of Mechanical Engineering,Dalian Jiaotong University,Dalian 116028,China)

机构地区：[1]大连交通大学机械工程学院

出　　处：《大连交通大学学报》2019年第4期108-111,共4页Journal of Dalian Jiaotong University

基　　金：辽宁省教育厅高等学校科学研究计划资助项目(JDL2017032);辽宁省“百千万人才工程”培养经费资助项目

摘　　要：研究了自主研发的两种磁控溅射靶,分别用于溅射非强磁性材料的普通靶和溅射强磁性材料的强磁靶.溅射靶工作时,靶阴极表面的磁场约束带电粒子并提高氩离子体密氩离子轰击靶材而实现溅射镀膜.通过模拟溅射靶的磁场强度分布,优化了磁极形状和高度.溅射靶可兼备直流溅射和射频溅射功能,射频放电的测试结果显示,两种溅射靶的成膜溅射和功率成正比,普通靶的靶材利用率相比国际上同类提高了6%~10%,强磁靶对厚度为2mm的铁靶材仍可有效溅射镀膜.Two kinds of domestically made magnetron sputtering targets used for nonferromagnetic and ferromagnetic materialsare introduced.When the sputtering target is working,the magnetic field on the surface of the target cathode confines the charged particles and increases the density of the argon ions,and the argon ions bombard the target to complete the sputtering coating.By simulating the magnetic field distribution,the shape and height of the poles are optimized,and the targets are designed to work by both DC and RF power supplies.The test results show that the sputtering rates are stable and in proportion to the RF power.The target utilization rate of the nonferromagnetic material target is increased by 6-10%compared with the international similarity,and the ferromagnetic target can effectively work for 2mm thickness iron material.

关 键 词：磁控溅射 辉光放电 磁场强度分布 薄膜 

分 类 号：TB306[一般工业技术—材料科学与工程]