Design and analysis method of moire magnifier based on depth cues from disparity  

作　　者：OUYANG Chun-bao LIU Gang XIONG Ying TIAN Yang-chao 欧阳春宝;刘刚;熊瑛;田扬超(National Synchrotron Radiation Laboratory, University of Science and Technology of China)

机构地区：[1]National Synchrotron Radiation Laboratory, University of Science and Technology of China

出　　处：《Optoelectronics Letters》2019年第4期255-259,共5页光电子快报（英文版）

基　　金：supported by the National Key Basic Research Program of China(No.2016YFA0400902)

摘　　要：Several methods have been developed to design and analyze moire magnifier, but these methods are all lack of quantitative consideration on the depth of moire imaging. In this paper, a new design method for moire magnifier based on depth cues from disparity is proposed. By using of the proposed method, the period magnification, the rotation angle of moire pattern can also be calculated, and the moire depth can be analyzed, too. According to the design and analysis results using MATLAB, the period of arrays and the cross angle are the important influence factors as the moire pattern above or below the microlens array. Moreover, with our 3 D design method, we can design different moire magnifier with different size, direction angle and depth of moire pattern as required.

关 键 词：Design analysis METHOD MOIRE MAGNIFIER DEPTH CUES from DISPARITY 

分 类 号：TN[电子电信]