扫描干涉光刻机的超精密移相锁定系统  

Ultra-precision phase-shifting locking system of scanning beam interference lithography tool

作　　者：王磊杰[1] 张鸣[1] 朱煜[1] 鲁森[1] 杨开明[1] WANG Lei-jie;ZHANG Ming;ZHU Yu;LU Sen;YANG Kai-ming(State Key Laboratory of Tribology&Beijing Key Lab of Precision/Ultra-precision Manufacturing Equipments and Control,Department of Mechanical Engineering,Tsinghua University,Beijing 100084,China)

机构地区：[1]清华大学机械工程系摩擦学国家重点实验室&精密超精密制造装备及控制北京市重点实验室

出　　处：《光学精密工程》2019年第8期1765-1773,共9页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.51677104);中国博士后科学基金资助项目(No.2017M610885);02国家重大科技专项资助项目(No.2018ZX02101003)

摘　　要：扫描干涉光刻机移相锁定是实现大面积高精度全息光栅曝光拼接的关键之一。为了实现大面积高精度全息光栅高精度曝光拼接,针对扫描干涉光刻机步进扫描拼接轨迹,重点开展了移相锁定系统的研究。在零差移频式相位锁定分系统和外差利特罗式光栅位移测量干涉仪的基础上,阐述了扫描干涉光刻机的新型移相锁定系统原理。针对新型的移相锁定系统原理,构建了移相锁定控制系统实验装置。最后,基于移相锁定控制实验装置,针对移相锁定定位性能,开展了移相锁定定位控制实验以及影响控制精度的因素分析,实现了±3.27 nm(3σ,Λ=251 nm)的定位控制精度;针对移相跟踪控制性能,在移相跟踪控制精度实验分析的基础上,利用陷阱滤波&PID控制实现了±4.17 nm(3σ,Λ=251 nm)的跟踪控制精度。Phase-shifting locking is one of the key aspects of Scanning Beam Interference Lithography(SBIL)in achieving highly accurate exposure stitching of a large grating.To achieve this objective,a phase-shifting locking system was investigated for the stepping/scanning exposure trajectory of SBIL.Firstly,based on a previously proposed homodyne frequency-shifting interference pattern locking system and a heterodyne Littrow grating interferometer,a novel phase-shifting locking system scheme was proposed for SBIL.An experimental setup was then designed for this proposed scheme.Based on the setup,experimental and factor analyses were conducted to facilitate precise phase-shifting positioning control and an accuracy of±3.27 nm(3σ,Λ=251 nm)was achieved.In addition,an accuracy of±4.17 nm(3σ,Λ=251 nm)was achieved for phase-shifting locking control using a notch and PID control.

关 键 词：扫描干涉光刻 零差移频式相位锁定 外差利特罗光栅干涉仪 移相锁定控制 陷阱滤波 

分 类 号：TH74[机械工程—光学工程] TP273[机械工程—仪器科学与技术]