金刚石聚晶碳膜场发射的场增强特征研究  

Field Enhancement Characteristics of Field Emission of Diamond Polycrystalline Carbon Films

作　　者：高金海[1,2] 李成刚 张洁 张兵临[2] GAO Jinhai;LI Chenggang;ZHANG Jie;ZHANG Binglin(Dept,of Phys.,Zhengzhou Teachers College.Zhengzhou 450044,CHN;Dept,of Physical Engin.,Key Lab.of Materials Physics of the Ministry of Education*Zhengzhou University,Zhengzhou 450052,CHN)

机构地区：[1]郑州师范学院物理系,郑州450044 [2]郑州大学物理工程学院材料物理教育部重点实验室,郑州450052

出　　处：《半导体光电》2019年第5期671-674,共4页Semiconductor Optoelectronics

基　　金：教育部科学技术重点项目(205091);河南省高等学校重点科研项目(16A140039);河南省科技厅科技攻关项目(182102210140)

摘　　要：利用微波等离子体化学气相沉积法(MPCVD),在镀金属钛的纯平陶瓷衬底上制备出一层微米量级的类球状金刚石聚晶颗粒碳膜。通过拉曼光谱仪、X射线衍射仪分析了碳膜的成分,通过扫描电子显微镜观察了碳膜的外部形貌。最后利用场发射的二级结构装置测试了碳膜的场发射性能。讨论了金刚石聚晶碳膜的场发射机理,得出碳膜场发射性能优异的原因是金刚石聚晶碳膜表面存在强大的场增强现象。A layer of spherical diamond-like polycrystalline carbon film was prepared by microwave plasma chemical vapor deposition(MPCVD)on a flat ceramic substrate plated with titanium.The composition of the carbon film was analyzed by Raman spectrometer and X-ray diffractometer.Then the field emission performance was tested with the secondary structure of field emission device.And the field emission mechanism of diamond polycrystalline carbon film was discussed.The reason of excellent field emission performance is the strong field enhancement on the surface of diamond polycrystalline carbon film.

关 键 词：MPCVD 场致电子发射 金刚石聚晶碳膜 

分 类 号：O484[理学—固体物理]