氟化钙晶体深紫外激光辐照损伤特性研究进展  

Development of Research on Damage Characteristics of Calcium Fluoride Crystal Under Deep Ultraviolet Laser Irradiation

作　　者：宗慧雯 赵江山[1,2,3] 宋兴亮 郭馨[1,2] 王倩 李慧 周翊[1,2,3] Zong Huiwen;Zhao Jiangshan;Song Xingliang;Guo Xin;Wang Qian;Li Hui;Zhou Yi(Department of Projection Optics,Academy of Opto-Electronics,Chinese Academy of Sciences,Beijing 100094,China;Beijing Excimer Laser Technology and Engineering Center,Beijing 100094,China;University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]中国科学院光电研究院投影光学室,北京100094 [2]北京市准分子激光工程技术研究中心,北京100094 [3]中国科学院大学,北京100049

出　　处：《激光与光电子学进展》2019年第19期18-27,共10页Laser & Optoelectronics Progress

基　　金：国家重大科技专项(2013ZX02202)

摘　　要：半导体光刻技术带动着光源逐步向短波辐射方向发展,以KrF-248nm、ArF-193nm光源为代表的准分子激光光刻光源逐步取代了以往基于汞灯的光刻光源,成为当前半导体光刻技术发展的主流光源。目前应用于光刻光源的光学元件主要以在深紫外波段具有优异传输特性的氟化钙(CaF2)材料为主。针对光源研发过程中涉及的光学元件与激光相互作用时会发生损伤的问题,从CaF2材料自身的物化特性、激光辐射特性以及激光与材料相互作用产生损伤的机理三个方面,综合分析了CaF2材料抗紫外激光研究的发展情况,比较了不同应用背景下CaF2材料的激光损伤特性,总结归纳了提高光学元件激光损伤阈值的措施和方法。The development of semiconductor lithography technology requires light sources with short wavelengths.Excimer laser-based lithography light sources(i.e.,KrF-248nm and ArF-193nm)are gradually replacing the previously used light sources based on a Hg lamp,which are the commonly used light sources in current semiconductor lithography technology.The optical components that are currently employed in lithographic light sources primarily use calcium fluoride(CaF2)materials,which have excellent transmission characteristics in the deep ultraviolet region.In this study,the damage characteristics of the laser-material interaction in the development of the light source are analyzed.The development of the research on ultraviolet resistance of CaF2 materials is comprehensively analyzed by investigating the physicochemical properties of CaF2 materials,characteristics of laser radiation,and damage mechanism of the laser-material interaction.The laser damage characteristics of CaF2 materials for different applications are compared.The approaches and methods to improve the damage thresholds of optical components are summarized.

关 键 词：激光光学 准分子激光 氟化钙 激光损伤 损伤阈值 

分 类 号：TN247[电子电信—物理电子学]