含氢氦锆膜的中子反射及弹性反冲探测表征  

Characterization of zirconium films containing hydrogen and helium by neutron reflection and elastic recoil detection

作　　者：夏婷 杨朝文[1] 任建坤 李新喜[2] 王燕[2] 黄朝强[2] XIA Ting;YANG Chao-Wen;REN Jian-Kun;LI Xin-Xi;WANG Yan;HUANG Chao-Qiang(School of Physics Science and Technology,Sichuan University,Chengdu 610064,China;Key Lab of Neutron Physics,Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics,Mianyang 621999,China)

机构地区：[1]四川大学物理科学与技术学院,成都610064 [2]中国工程物理研究院核物理与化学研究所中子物理学重点实验室,绵阳621999

出　　处：《原子与分子物理学报》2019年第6期976-981,共6页Journal of Atomic and Molecular Physics

基　　金：中国工程物理研究院院长基金(YZ2015009)

摘　　要：采用直流磁控溅射方法制备含氢氦的锆膜,利用中子反射和弹性反冲探测两种方法分别对样品中的氢、氦分布以及浓度进行表征,并探究了不同温度退火处理后H、He的变化.实验结果表明:中子反射与弹性反冲探测两种方法的表征结果具有很好的一致性,H、He在锆层中近似均匀分布,氦浓度与溅射的He/Ar比成正比.300℃退火处理1 h后,样品中的H从Zr层向外迁移和释放,且这种现象随退火温度升高到500℃时更加明显.The zirconium films containing hydrogen and helium are prepared by DC magnetron sputtering,and the concentrations and distributions of hydrogen and helium are characterized by neutron reflection and elastic recoil detection technology.Changes of hydrogen and helium depth distribution in samples under annealed at different temperature are also investigated.The results show that the information of He and H obtained from neutron reflectometry is consistent with that from elastic recoil detection,H and He atoms are homogeneously distributed in the Zr layer,and the helium concentration increases with increasing of the He/Ar ratio of ambient atmosphere.H atoms migrate and release from the Zr film annealed at 300℃for an hour,which is more obvious as the annealing temperature above 500℃.

关 键 词：锆膜 磁控溅射 中子反射 弹性反冲探测 真空退火 

分 类 号：O571.56[理学—粒子物理与原子核物理]