光刻机视像自动对准系统的开发  

Development of Visual Automatic Alignment System for Lithography Machine

作　　者：王勇 封国齐[3] 陈旭东 曹永辉 WANG Yong;FENG Guoqi;CHEN Xudong;CAO Yonghui(Hangzhou Nuorong Measurement and Control Co.,Ltd,Hangzhou 310018,China;Department of digital media technology Hangzhou Dianzi University,Hangzhou 310018,China;Hangzhou Silan Integrated Circuit Co.,Ltd,Hangzhou 310018,China)

机构地区：[1]杭州诺荣测控技术有限公司,浙江杭州310018 [2]杭州电子科技大学数字媒体技术系,浙江杭州310018 [3]杭州士兰集成电路有限公司,浙江杭州310018

出　　处：《电子工业专用设备》2019年第6期45-49,共5页Equipment for Electronic Products Manufacturing

摘　　要：设计视像自动对准系统采用工业相机从MICRALIGN M系列投影式光刻机的双目显微镜提取含有掩模对准标记和晶圆对准标记图像,经过图像处理后获取对准标记的位置坐标以及掩模标记与晶圆标记间坐标差,控制晶圆或者掩模调整平台位置,实现光刻机的视像自动对准功能。经过现场批量生产验证,视像自动对准系统的对准精度优于1μm。标记识别率与掩模和晶圆的图像有关,对于某类产品标记识别率达到99%以上,一般类别产品标记识别率可以达到97%以上,可以满足现场自动化生产要求。The video automatic alignment system developed in this paper firstly obtains images which contain mask alignment remarks and wafer alignment remarks using industrial camera from MICRALIGN M series projection lithography binocular microscope. Secondly the alignment remarks position coordinates are searched by image processing. And then the coordinate differences between mask remarks and wafer remarks are calculated. The differences are used to drive the precise adjustment system of wafer or mask stage to realize automatic video lithography alignment function.After in-situ mass production verification,the alignment accuracy of the video automatic alignment system is below 1 μm. The remarks identification rate is related to the image of the mask and wafer,for a certain type of product remarks identification rate reaches more than 99%,the general category of product remarks identification rate can reach more than 97%,can meet the requirements of in-situ automation production.

关 键 词：光刻机 视像 自动对准 机器视觉 

分 类 号：O439[机械工程—光学工程]