原子层沉积微通道板的研究进展  

Research Progress of Atomic Layer Deposited Micro-channel Plate

作　　者：郭俊江 朱香平[1,2] 许彦涛 曹伟伟[1,2,3] 邹永星 陆敏[1] 彭波 司金海[3] 郭海涛[1] GUO Junjiang;ZHU Xiangping;XU Yantao;CAO Weiwei;ZOU Yongxing;LU Min;PENG Bo;SI Jinhai;GUO Haitao(State Key Laboratory of Transient Optics and Photonics,Xi'an Institute of Optics and Precision Mechanics,Chinese Academy of Sciences,Xi'an 710119,China;University of Chinese Academy of Sciences,Beijing 100049,China;School of Electronic and Information Engineering,Xi'an Jiao Tong University,Xi an 710049,China)

机构地区：[1]中国科学院西安光学精密机械研究所瞬态光学与光子技术国家重点实验室,西安710119 [2]中国科学院大学,北京100049 [3]西安交通大学电子与信息工程学院,西安710049

出　　处：《材料导报》2020年第3期80-89,共10页Materials Reports

基　　金：国家重点研发计划(2016YFB0303804)~~

摘　　要：微通道板(MCP)是光通讯和光电子技术领域实现电子倍增和信号放大的核心器件,其性能提升主要包括提高增益、延长寿命和降低暗计数。目前国内外普遍使用的商品化微通道板仍是基于传统铅硅酸盐玻璃经氢还原工艺制备的。尽管经过四代玻璃组分和制备工艺优化,MCP增益可达103,寿命为0.3 C/cm^2,暗计数为0.25 events/(s·cm^2),但由于玻璃组分和复杂制备工艺的限制,其离子反馈、背景噪声很难进一步降低,增益也无法大幅提升。鉴于此,近10年来科研人员提出并完善了新的解决方案——利用原子层沉积(ALD)技术,在硼硅酸盐玻璃基板孔内制备导电层和二次电子发射层等功能层,从而获得具有导电和电子倍增能力的微通道板。这种新型原子层沉积微通道板(ALD-MCP)有效避免了基板玻璃材料对其性能优化的制约,实现了基板材料和功能材料的独立设计,能够显著提高微通道板的综合性能。经过一系列尝试,国际上已开发出性能远优于传统MCP的ALD功能层:以Al2 O3/ZnO、Al2 O3/W或Al2 O3/Mo为导电层,MgO或Al2 O3为二次电子发射层的ALD-MCP增益已达104,暗计数降低至0.078 events/(s·cm^2),寿命提升至7 C/cm^2,但是其性能稳定性仍有待进一步提高。此外,还需要在提高沉积效率、优化调控功能层性能等方面进一步深入研究。本文从功能层的组成和微通道板的性能两方面归纳、梳理了利用原子层沉积技术制备微通道板的国内外研究情况,并总结了目前研究中存在的不足,展望了未来发展趋势。The microchannel plate(MCP)is the core device for electronic multiplication and signal amplification in the fields of optical communication and optoelectronic technology,and the performance improvement research of MCP is mainly focused on increasing gain,extending service life and reducing dark count.Currently,the commonly used commercial MCPs are still prepared based on the traditional lead silicate glass via hydrogen reduction process.Although its gain,lifetime and dark count can reach 103,0.3 C/cm^2,0.25 events/(s·cm^2),respectively,optimized by four generations of glass components and preparation process,the glass composition and complicated preparation process limit its further en-hancement in performance,e.g.lower ion feedback and background noise,and higher gain.In view of this,researchers have proposed and perfected a new solution over the past decade:adopting atomic layer deposition(ALD)techno-logy to deposit functional layers,including the conductive layers and secondary electron emission layers onto the surface of borosilicate glass sub-strates.Thereby,an MCP with conduction and electron multiplication capability is obtained.This novel ALD-MCP can effectively avoid the restric-tion of substrate glass on its performance optimization,realize the independent design of the substrate glass and the functional layer’s materials,and significantly improve the comprehensive performance of the MCP.Through continuous attempts,the ALD functional layers exhibiting much superior performance to that of traditional MCP have been developed.The prevailing deposition materials for conductive layer are Al2 O3/ZnO,Al2 O3/W or Al2 O3/Mo,and for the secondary electron emission layers are MgO or Al2 O3,with the products gain elevated to 104,dark count reduced to 0.078 events/(s·cm^2),and lifetime prolonged to 7 C/cm^2.However,its stability still requires further improvement.In addition,deeper investigations are needed to improve deposition efficiency,and to optimize and regulate the performance of functional layers.This pa

关 键 词：微通道板 原子层沉积 功能层 增益 寿命 

分 类 号：O484.1[理学—固体物理]