高温制备非晶五氧化二钒薄膜的光学减反特性  

Optical Anti-reflection Properties of Amorphous Vanadium Pentoxide Thin Films Prepared at High Temperature

作　　者：王秋仅 王海[1] WANG Qiujin;WANG Hai(Department of Physics,Capital Normal University,Beijing 100048)

机构地区：[1]首都师范大学物理系

出　　处：《首都师范大学学报（自然科学版）》2020年第1期14-18,共5页Journal of Capital Normal University：Natural Science Edition

摘　　要：采用超高真空磁控溅射在Al2O3/Si基底上制备非晶五氧化二钒(V2O5)薄膜,并研究了高温退火对其晶体结构、表面形貌和光学特性的影响.扫描电子显微镜观察表明样品表面平滑致密具有连续性.在可见光波范围内,制备态薄膜在波长497nm处出现反射率的最小值(约18%).经15min高温退火处理后,样品X射线衍射光谱中除基底衍射峰外无其他衍射峰出现,表明样品依旧为非晶态.高温退火后的样品反射率最小值可进一步降低至约6%.上述结果对于以V2O5薄膜为基础的高温光学器件制备和应用有一定借鉴价值.The amorphous vanadium pentoxide(V2 O5)thin films were prepared on the Al2 O3/Si substrates by ultra-high vacuum magnetron sputtering,and the effects of high temperature annealing on the crystal structure,surface morphology and optical properties were studied.The surface of the sample was smooth and dense with continuity,which was showed through scanning electron microscopy.In the visible light range,the film reflectivity was smallest(about 18%)at the wavelength of 497 nm.After high-temperature annealing for 15 minutes,there was no other diffraction peak in the X-ray diffraction spectrum of the sample except the diffraction peak of the substrate,indicating that the sample was still amorphous.The minimum reflectivity of samples after high temperature annealing can be further reduced to about 6%.This work could be helpful for the preparation and application of high temperature optical devices based on V2 O5 thin films.

关 键 词：超高真空 高温 非晶V2O5薄膜 反射率 

分 类 号：O469[理学—凝聚态物理]