Broadband mid-IR antireflective Reuleaux-triangle-shaped hole array on germanium  

作　　者：Haijuan Cheng Miao Dong Qinwen Tan Linghai Meng Yi Cai Jie Jiang Weisheng Yang Haizheng Zhong Lingxue Wang 程海娟;东苗;谭钦文;孟令海;蔡毅;姜杰;杨伟声;钟海政;王岭雪(Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems,Key Laboratory of Photoelectronic Imaging Technology and System,Ministry of Education,School of Optics and Photonics,Beijing Institute of Technology,Beijing 100081,China;Yunnan KIRO-CH Photonics Co.,Ltd.,Beijing 100081,China;School of Materials Science&Engineering,Beijing Institute of Technology,Beijing 100081,China)

机构地区：[1]Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems,Key Laboratory of Photoelectronic Imaging Technology and System,Ministry of Education,School of Optics and Photonics,Beijing Institute of Technology,Beijing 100081,China [2]Yunnan KIRO-CH Photonics Co.,Ltd.,Beijing 100081,China [3]School of Materials Science&Engineering,Beijing Institute of Technology,Beijing 100081,China

出　　处：《Chinese Optics Letters》2019年第12期77-80,共4页中国光学快报（英文版）

基　　金：supported by the National Natural Science Foundation of China(No.61722502)

摘　　要：A gradient-index Reuleaux-triangle-shaped hole array was fabricated on germanium(Ge)by nanoimprint lithography and inductively coupled plasma processing as a broadband mid-infrared(IR)antireflective surface.The interaction between the{111}planes of cubic crystalline Ge and a circular mold successfully produced an orderly and periodically distributed Reuleaux-triangle-shaped hole array.As a result,the average transmittance increased 15.67% over the waveband at 3–12μm and remained stable at the incidence angle of up to 60°.The vertices of the Reuleaux triangle showed local enhancement of the electric field intensities due to interference of the incident and reflected radiation fields.It was also found that nonuniform hole depths acted to modulate the transmittance over the 3–12μm waveband.A gradient-index Reuleaux-triangle-shaped hole array was fabricated on germanium(Ge) by nanoimprint lithography and inductively coupled plasma processing as a broadband mid-infrared(IR) antireflective surface.The interaction between the {111} planes of cubic crystalline Ge and a circular mold successfully produced an orderly and periodically distributed Reuleaux-triangle-shaped hole array. As a result, the average transmittance increased 15.67% over the waveband at 3–12 μm and remained stable at the incidence angle of up to 60°.The vertices of the Reuleaux triangle showed local enhancement of the electric field intensities due to interference of the incident and reflected radiation fields. It was also found that nonuniform hole depths acted to modulate the transmittance over the 3–12 μm waveband.

关 键 词：REFLECTIVE LITHOGRAPHY shaped 

分 类 号：O614.431[理学—无机化学] TN215[理学—化学]