基于CMOS图像传感器的彩色滤镜和微透镜工艺研究  

Study on Color Filter and Microlens Technology Based on CMOS Image Sensor

作　　者：史海军 叶红波[1] SHI Haijun;YE Hongbo(Testing Technology Department of Shanghai IC R&D Center,Shanghai 201203,China)

机构地区：[1]上海集成电路研发中心测试技术部

出　　处：《集成电路应用》2020年第2期34-36,共3页Application of IC

基　　金：国家科技重大专题课题(2011ZX02702_004)

摘　　要：对CMOS图像传感器加工彩色滤镜和微透镜工艺进行深入研究,总结出整个滤镜和微透镜工艺的流程及加工方法。虽然其工艺具有相当的难度,然而平面化和微透镜技术是先进色彩处理技术必须解决和实现的关键问题,所以彩色滤镜的工艺继续开发和研究是非常有积极意义的。In this paper,the current CMOS image sensor processing color filter and microlens process are deeply studied,and the flow and processing methods of the whole filter and microlens process are summarized.Although the process is quite difficult,planarization and microlens technology are key issues that must be solved and implemented by advanced color processing techniques,so the development and research of color filter processes is very positive.

关 键 词：CMOS图像传感器 像素阵列 彩色滤镜 微透镜 工艺技术 

分 类 号：TN432[电子电信—微电子学与固体电子学] TP212[自动化与计算机技术—检测技术与自动化装置]