脉冲偏压对TiAlCN薄膜结构与力学性能的影响  

Effect of pulse negative bias on microstructure and mechanical property of TiAlCN films

作　　者：任鑫[1] 窦春岳 齐鹏涛 赵瑞山[1] REN Xin;DOU Chun-yue;QI Peng-tao;ZHAO Rui-shan(College of Material Science and Engineering,Liaoning Technical University,Fuxin 123000,China)

机构地区：[1]辽宁工程技术大学材料科学与工程学院,辽宁阜新123000

出　　处：《材料热处理学报》2020年第3期151-155,共5页Transactions of Materials and Heat Treatment

基　　金：辽宁省教育厅科学技术研究资助项目(LJYL007)。

摘　　要：利用多弧离子镀-磁控溅射复合技术通过改变脉冲偏压在Si片与SS304基体表面制备了TiAlCN薄膜,研究了不同脉冲偏压对薄膜结构和力学性能的影响。薄膜成分、表面形貌、相结构及力学性能分别利用能量弥散X射线谱(EDS)、扫描电镜(SEM)、X射线衍射(XRD)和纳米压痕仪等设备进行表征。结果表明,随着脉冲负偏压的增加,薄膜中Ti元素的含量先减小后增大,而Al元素有相反的变化趋势。适当增大脉冲偏压,薄膜表面颗粒、凹坑等缺陷得到明显改善。物相分析表明TiAlCN薄膜主要由(Ti,Al)(C,N)相,Ti4N3-x相和Ti3Al相组成。薄膜平均硬度与弹性模量随脉冲负偏压的增加先增大后减小,在负偏压-200 V时达到最大值分别为36.8 GPa和410 GPa。TiAlCN films were prepared on the surface of Si sheet and AISI 304 stainless steel substrate by multi-arc ion plating and magnetron sputtering technique. The effects of different pulse negative bias on structure and mechanical properties of the films were studied. The composition, surface morphology, phase structure and mechanical properties of the films were characterized by means of energy dispersive X-ray spectroscopy(EDS), scanning electron microscopy(SEM), X-ray diffraction(XRD) and nano-indentation instrument. The results show that with the increase of pulse negative bias, the content of Ti element in the films decreases at first and then increases, while Al element has the opposite trend. By properly increasing the pulse negative bias, the defects such as particles and pits on the surface of the films are obviously improved. The phase analysis results show that the TiAlCN films are mainly composed of(Ti,Al)(C, N) phase, Ti4N3-xphase and Ti3Al phase. The average hardness and elastic modulus of the films increase at first and then decrease with the increase of pulse negative bias, and reach the maximum values of 36.8 GPa and 410 GPa at pulse negative bias of-200 V, respectively.

关 键 词：TiAlCN薄膜 复合离子镀 脉冲偏压 结构 力学性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]