Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma enhanced magnetron co-sputtering  

作　　者：Hanghang WANG Liyan ZHANG Wenqi LU Jun XU 王行行;张丽艳;陆文琪;徐军(Key Laboratory of Materials Modification by Laser,Ion and Electron Beams,Ministry of Education,School of Physics,Dalian University of Technology,Dalian 116024,People’s Republic of China;School of Chemical Engineering,Dalian University of Technology,Dalian 116024,People’s Republic of China)

机构地区：[1]Key Laboratory of Materials Modification by Laser,Ion and Electron Beams,Ministry of Education,School of Physics,Dalian University of Technology,Dalian 116024,People’s Republic of China [2]School of Chemical Engineering,Dalian University of Technology,Dalian 116024,People’s Republic of China

出　　处：《Plasma Science and Technology》2020年第3期66-70,共5页等离子体科学和技术（英文版）

摘　　要：A kind of combinatorial material methodology,also known as continuous compositional spread method,was employed to investigate the relationship between the optical band gap and composition of SiC thin films.A wide range of SixCy thin films with different carbon contents have been successfully deposited in a single deposition by carefully arranging the sample position on the substrate holder.The films were characterized by surface profiler,x-ray photoelectron spectroscopy,ultraviolet-visible spectroscopy,fourier transform infrared spectroscopy and Raman spectroscopy.The carbon content y increases linearly from 0.28 to 0.72 while the sample position changed from 85 to 175 mm,the optical band gap changed between 1.27 and 1.99 eV,the maximum value corresponded to the stoichiometric SiC sample at the position of 130 mm,which has the highest Si?C bond density of 11.7×10^22 cm^-3.The C poor and C rich SixCy samples with y value less and larger than 0.5 were obtained while samples deviated from the position 130 mm,the optical band gap decreased with the Si?C bond density.

关 键 词：CONTINUOUS compositional SPREAD method silicon CARBIDE optical band gap magnetron SPUTTERING RAMAN and IR spectra 

分 类 号：TN304.05[电子电信—物理电子学]