Cr-N-O型选择性吸收涂层制备及热稳定性研究  被引量:3

PREPARATION AND THERMAL STABILITY OF Cr-N-O BASED SELECTIVE ABSORBING COATING

在线阅读下载全文

作  者:孙志强[1] 刘静[1] 杨中周[1] 汪洪[1] 左岩[1] Sun Zhiqiang;Liu Jing;Yang Zhongzhou;Wang Hong;Zuo Yan(State Key Laboratory of Green Building Materials,China Building Materials Acadamy,Beijing 100024,China)

机构地区:[1]绿色建筑材料国家重点实验室,中国建筑材料科学研究总院,北京100024

出  处:《太阳能学报》2020年第3期214-218,共5页Acta Energiae Solaris Sinica

基  金:国家科技支撑计划(2015BAA02B01)。

摘  要:采用反应磁控溅射方法制备SiO_x/Cr-N-O/Al选择性吸收涂层,该涂层太阳吸收比为95.9%、发射比3.8%、吸收发射比25.2。结合光学显微镜微观形貌分析、X射线衍射结构分析(XRD)、X射线光电子能谱成分分析(XPS)探讨涂层在250和400℃大气环境下热稳定性机理:250℃大气热处理后,涂层保持较高光谱选择性,表面形貌与物相结构未出现明显变化,SiO_x层氧化程度增大导致太阳吸收比升高,金属Cr和金属Al相互扩散导致发射比升高;400℃大气热处理后,涂层光谱选择性降低,表面出现微米级孔洞,XRD及XPS结果表明Cr-N-O吸收层被氧化,导致太阳吸收比降低,金属Cr和金属Al相互扩散导致发射比明显升高。Selective absorbing coating SiOx/Cr-N-O/Al was deposited by reactive magnetron sputtering. Its solar absorptance α,thermal emittance(100 ℃)ε,and selectivity α/ε are 95.9%,3.8%,and 25.2 respectively. The thermal stability of the coating at 250 ℃ and 400 ℃ in air was analyzed based on the characteratics of optical microscope,XRD and XPS. The results show that the coating can keep a high spectrally selectivity after heat treatment at 250 ℃ in air;the surface morphology,composition and structure of the coating have no obvious changes;with SiO2 oxidation increasing,the solar absorption increases;and diffusion between Cr and Al layer leads to degradation of thermal emittance. After heat treatment at 400 ℃ in air,the spectral selectivity of the coating decreases,and many micron holes appear on the surface of the coating,the result of XRD and XPS show that the oxidation of Cr-N-O absorbing layer is the reason of the absorptivity decrease,and the diffusion between Cr and Al layer resultes in the significant degradation of the thermal emittance.

关 键 词:太阳能吸收涂层 磁控溅射 吸收光谱 热稳定性 氮氧化铬 

分 类 号:TB333[一般工业技术—材料科学与工程]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象