氮氩气流量比对磁控溅射氮化钛薄膜微观结构的影响  

Effect of nitrogen-to-argon flow ratio on microstructure of magnetron-sputtered titanium nitride film

作　　者：王槐乾 姜宏伟[1] 黄海亮[1] 王方标 左桂鸿[1] 郑友进[1] WANG Huaiqian;JIANG Hongwei;HUANG Hailiang;WANG Fangbiao;ZUO Guihong;ZHENG Youjin(Mudanjiang Normal College,Mudanjiang 157000,China)

机构地区：[1]牡丹江师范学院,黑龙江牡丹江157000

出　　处：《电镀与涂饰》2020年第7期405-409,共5页Electroplating & Finishing

基　　金：黑龙江省自然基金(LH2019E126);牡丹江师范学院项目(GP201605);黑龙江省高等教育教学改革项目(SJGY20180528)。

摘　　要：采用扫描电镜(SEM)和X射线衍射仪(XRD)研究了氮气流量(5、10、25、50 sccm)及氮氩气流量比(4∶1、3∶2、2∶3、1∶4)对磁控溅射TiN薄膜微观形貌和相组成的影响。结果显示,所得样品具有纳米级TiN薄膜的基本特征。当N2与Ar的总流量为5 sccm,而它们的流量比为4∶1时,可以制得品质较好的蓝紫色TiN薄膜。The effects of nitrogen flow rate(5,10,25,or 50 sccm)and nitrogen-to-argon flow ratio(4:1,3:2,2:3,1:4)on micromorphology and phase constitution of the TiN film prepared by magnetron sputtering were studied using scanning electron microscope(SEM)and X-ray diffractometer(XRD).The results showed that all the TiN films prepared were characterized by a nanocrystalline structure.The TiN film deposited at N24 sccm and Ar 1 sccm was bluish purple and had good morphology.

关 键 词：氮化钛 磁控溅射 氮气 氩气 流量比 微观结构 颜色 

分 类 号：TB742[一般工业技术—材料科学与工程]