HR-ICP-MS测定电子级N-甲基吡咯烷酮中痕量金属杂质  

Determination of trace metal impurities in electronic-grade N-methyl pyrrolidone by HRICP-MS

作　　者：郝萍[1] 李春华[1] Hao Ping;Li Chunhua(Shanghai Institute of Measurement and Testing Technology)

机构地区：[1]上海市计量测试技术研究院

出　　处：《上海计量测试》2020年第2期2-5,共4页Shanghai Measurement and Testing

基　　金：上海市科学技术委员会科研计划项目(18142203300)。

摘　　要：文章采用高分辨电感耦合等离子体质谱仪(HR-ICP-MS)检测电子级N-甲基吡咯烷酮(NMP)中金属杂质元素,采用标准加入法进行定量测试,回收率为92.40%~110.25%,重复性相对标准偏差为0.19%~3.78%,检测限满足电子级NMP中金属杂质含量在0.1~1μg/kg级别测试需求。In this paper,high resolution inductively coupled plasma mass spectrometry(HR-ICP-MS)was used to detect metal impurities in electronic NMP.The standard addition method was used for quantitative test.The recovery was 92.40%-110.25%,the relative standard deviation of repeatability was 0.19%-3.78%,and the detection limit met the requirement of 0.1-1μg/kg level of metal impurities in electronic NMP.

关 键 词：电子级N-甲基吡咯烷酮 等离子体质谱仪 痕量金属杂质 标准加入法 

分 类 号：O657.63[理学—分析化学]