磁控溅射法制备的FePt薄膜的结构与性能  

FePt thin films with improved structure and magnetic properties by magnetron sputtering

作　　者：刘静[1] 胡胜龙[2] 刘仲武[3] 戴晓莉[1] 欧阳玲玉 张元青[2] 箫笃飞 王健[1] LIU Jing;HU Sheng-long;LIU Zhong-wu;DAI Xiao-li;OUYANG Ling-yu;ZHANG Yuan-qing;XIAO Du-fei;WANG Jian(School of Mechanical Engineering,Jiangxi College of Applied Technology,Ganzhou 341000,China;School of Automotive Studies,Jiangxi College of Applied Technology,Ganzhou 341000,China;School of Material Science and Engineering,South China University of Technology,Guangzhou 510640,China)

机构地区：[1]江西应用技术职业学院机电学院,江西赣州341000 [2]江西应用技术职业学院汽车学院,江西赣州341000 [3]华南理工大学材料科学与工程学院,广东广州510640

出　　处：《磁性材料及器件》2020年第2期9-15,共7页Journal of Magnetic Materials and Devices

基　　金：国家自然科学基金资助项目(51774146);江西省教育厅科学技术研究资助项目(GJJ171308)。

摘　　要：采用磁控溅射法在单晶Si(100)基片上制备了一系列FePt薄膜,研究了膜厚、退火温度和时间、Fe/Pt原子比对薄膜结构和磁性能的影响。研究表明,薄膜的有序度与膜厚有着密切的关系,厚度越厚,薄膜的有序化程度越高,矫顽力越高。退火温度的升高和退火时间的延长均可以使薄膜的矫顽力增高。富Fe的薄膜具有相对较高的有序度,Fe/Pt原子比为55:45时,有序化程度最高,矫顽力最高,平行方向的矫顽力为14.2 kOe。Fe/Pt原子比为50:50的薄膜,(001)垂直取向在膜厚为20 nm时获得。FePt films with various thicknesses and Fe/Pt atom ratios for recording medium were fabricated on Si(100)substrates by DC magnetron sputtering,followed by annealing at 500 to 700℃for 1 h.The influences of film thickness,Fe/Pt atom ratio and heat treatment on the structure and magnetic properties of the films were investigated.It was found that the film thickness has a great effect on the ordering degree of FePt films.The ordering degree and magnetic properties were improved by increasing the film thickness.The high annealing temperature and long annealing time can promote the atoms diffusion,resulting in an increase in the coercivity of the film.When Fe/Pt atomic ratio is 55:45,the film has the highest ordering degree,the fastest ordering process and the highest coercivity.The optimal magnetic property of Hc is 14.2 kOe.Perpendicular orientation can be obtained in the film when the film thickness is small,such as 20 nm.

关 键 词：FePt薄膜 磁记录 有序度 膜厚 退火 Fe/Pt原子比 结构 矫顽力 

分 类 号：TM271[一般工业技术—材料科学与工程] O484.43[电气工程—电工理论与新技术]