脉冲镀镉工艺的研究  

Study on Pulse Cadmium Electroplating Process

作　　者：徐长云 杨昭 刘爽华 XU Changyun;YANG Zhao;LIU Shuanghua(AECC Zhongchuan Transmission Machinery Co.,Ltd.,Changsha 410200,China;Aviation Military Representative Office of Army Equipment Aviation Representative Oficein Zhuzhou,Zhuzhou 410200,China)

机构地区：[1]中国航发中传机械有限公司,湖南长沙410200 [2]陆军装备部航空军事代表局驻株洲地区航空代表室,湖南株洲410200

出　　处：《电镀与环保》2020年第3期19-22,共4页Electroplating & Pollution Control

摘　　要：在氰化物光亮电镀镉工艺的基础上进行脉冲镀镉研究。阐述了脉冲电镀的基本概念,介绍了脉冲镀镉的工艺过程,比较了脉冲镀镉层与直流镀镉层的性能,并简要阐述了镀前消除应力和镀后除氢与氢脆之间的关系。Pulse cadmium electroplating process was studied based on cyanide bright cadmium electroplating process.The basic concept of pulse electroplating and the process of pulse cadmium electroplating were introduced,and the properties of pulse cadmium coating and direct current cadmium coating were compared.Meanwhile,the relationship between pre-plating stress relief and post-plating hydrogen removal and hydrogen embrittlement was briefly described.

关 键 词：直流电镀 脉冲电镀 镀镉 氢脆 

分 类 号：TQ153[化学工程—电化学工业]